Dr. Bo Su
Sr. Director of Product Management at D2S Inc
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Publications (33)

SPIE Journal Paper | 6 February 2024
JM3, Vol. 23, Issue 01, 011207, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011207
KEYWORDS: Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, SRAF, Critical dimension metrology, Lithography, Printing, Design, Scanning electron microscopy, Photomask technology

SPIE Journal Paper | 17 November 2021 Open Access
JM3, Vol. 20, Issue 04, 041405, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041405
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Vestigial sideband modulation, Semiconductor manufacturing, Manufacturing, Extreme ultraviolet, Physics, Semiconductors

Proceedings Article | 7 October 2020 Presentation + Paper
Proceedings Volume 11518, 115180W (2020) https://doi.org/10.1117/12.2579729

Proceedings Article | 31 March 2020 Presentation + Paper
Proceedings Volume 11327, 113270K (2020) https://doi.org/10.1117/12.2554867
KEYWORDS: Photomasks, Semiconducting wafers, SRAF, Lithography, Optical proximity correction, Extreme ultraviolet, Critical dimension metrology, Mask making

Proceedings Article | 3 October 2019 Paper
Proceedings Volume 11148, 111480U (2019) https://doi.org/10.1117/12.2534629
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Manufacturing, Vestigial sideband modulation, Semiconductor manufacturing, Extreme ultraviolet, Physics, Semiconductors, Semiconducting wafers, Optical proximity correction, Lithography, Manufacturing, Vestigial sideband modulation, Semiconductor manufacturing, Extreme ultraviolet, Physics, Semiconductors

Proceedings Article | 31 October 2017 Presentation + Paper
Proceedings Volume 10451, 1045108 (2017) https://doi.org/10.1117/12.2281686
KEYWORDS: Extreme ultraviolet, Photomasks, Data modeling, Vestigial sideband modulation, Point spread functions, Extreme ultraviolet lithography, Raster graphics, Scattering, Electro optical modeling, Process modeling

Proceedings Article | 13 July 2017 Paper
Proceedings Volume 10454, 1045407 (2017) https://doi.org/10.1117/12.2281110
KEYWORDS: Photomasks, Model-based design, Lithography, Computational lithography, Mask making, Process modeling, Optical proximity correction, Etching, Modulation, Convolution, Image processing

Proceedings Article | 13 July 2017 Paper
Proceedings Volume 10454, 1045409 (2017) https://doi.org/10.1117/12.2280841
KEYWORDS: Photomasks, Computer simulations, Process modeling, Model-based design, Data modeling, Optical proximity correction, Electron beam lithography, Reactive ion etching, Computer aided design, Mask making

SPIE Press Book | 25 September 2015
KEYWORDS: Metrology, Semiconducting wafers, Overlay metrology, Manufacturing, Photomasks, Inspection, Process control, Critical dimension metrology, Calibration, Semiconductors

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 923508 (2014) https://doi.org/10.1117/12.2073368
KEYWORDS: Photomasks, Monte Carlo methods, Manufacturing, Critical dimension metrology, Optical proximity correction, Modulation, Vestigial sideband modulation, Backscatter, Convolution, Electrons

Proceedings Article | 28 June 2013 Paper
C. Y. Chen, Ivan Wei, Laurent Tuo, C. S. Yoo, Dongxue Chen, Danping Peng, Masaki Satake, Bo Su, Linyong Pang
Proceedings Volume 8701, 870108 (2013) https://doi.org/10.1117/12.2030688
KEYWORDS: Photomasks, Scanning electron microscopy, Inspection, Image processing, Metrology, Image analysis, Scanners, Etching, Time metrology, Error analysis

Proceedings Article | 15 March 2012 Paper
Jing Zhang, Qingxiu Xu, Xin Zhang, Xing Zhao, Jay Ning, Guojie Cheng, Shijie Chen, Gary Zhang, Abhishek Vikram, Bo Su
Proceedings Volume 8327, 832716 (2012) https://doi.org/10.1117/12.918068
KEYWORDS: Semiconducting wafers, Wafer inspection, Metals, Inspection, Scanning electron microscopy, Defect detection, Image processing, Bridges, Semiconductors, Image classification

Proceedings Article | 14 October 2011 Paper
Eric Guo, Irene Shi, Blade Gao, Nancy Fan, Guojie Cheng, Li Ling, Ke Zhou, Gary Zhang, Ye Chen, Chingyun Hsiang, Bo Su
Proceedings Volume 8166, 81662D (2011) https://doi.org/10.1117/12.896879
KEYWORDS: Photomasks, Scanning electron microscopy, Image processing, Wafer-level optics, Semiconducting wafers, Lithography, Inspection, Process modeling, Optical inspection, Software development

Proceedings Article | 3 April 2010 Paper
Li-Fu Chang, Chang-Il Choi, Guojie Cheng, Abhishek Vikram, Gary Zhang, Bo Su
Proceedings Volume 7641, 764111 (2010) https://doi.org/10.1117/12.846673
KEYWORDS: Optical proximity correction, Design for manufacturing, Design for manufacturability, Lithography, Manufacturing, Edge detection, Semiconductors, Photomasks, Critical dimension metrology, Mask making

Proceedings Article | 23 September 2009 Paper
Eric Guo, Shirley Zhao, Skin Zhang, Sandy Qian, Guojie Cheng, Abhishek Vikram, Ling Li, Ye Chen, Chingyun Hsiang, Gary Zhang, Bo Su
Proceedings Volume 7488, 74880G (2009) https://doi.org/10.1117/12.829692
KEYWORDS: Photomasks, Scanning electron microscopy, Semiconducting wafers, Image processing, Lithography, Process modeling, Optical proximity correction, Printing, Wafer-level optics, Inspection

Proceedings Article | 17 October 2008 Paper
Jae-Hyun Kang, Jae-Young Choi, Yeon-Ah Shim, Hye-Sung Lee, Bo Su, Walter Chan, Ping Zhang, Joanne Wu, Keun-Young Kim
Proceedings Volume 7122, 71221N (2008) https://doi.org/10.1117/12.801312
KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Scanning electron microscopy, Detection and tracking algorithms, Databases, Bridges, Model-based design, Fuzzy logic, Defect detection

Proceedings Article | 17 October 2008 Paper
Hyesung Lee, Yeon-Ah Shim, Jae-Young Choi, Kwang-Seon Choi, Joanne Wu, Bo Su, Xinwei Zhou, Kenny Kim
Proceedings Volume 7122, 712221 (2008) https://doi.org/10.1117/12.801421
KEYWORDS: Optical proximity correction, Design for manufacturing, Nanoimprint lithography, Design for manufacturability, Semiconducting wafers, Lithography, Silicon, Wafer manufacturing, Yield improvement, Manufacturing

Proceedings Article | 1 April 2008 Paper
Yeonah Shim, Jaeyoung Choi, Jeahee Kim, Bo Su, Ping Zhang, Keun-Young Kim
Proceedings Volume 6925, 692513 (2008) https://doi.org/10.1117/12.772409
KEYWORDS: Optical proximity correction, Design for manufacturing, Lithography, Semiconducting wafers, Data processing, Semiconductors, Failure analysis, Integrated circuit design, Design for manufacturability, Manufacturing

Proceedings Article | 1 April 2008 Paper
Tom Wang, Joanne Wu, Qingwei Liu, Gary Zhang, Benny Wang, Bo Su, Guojie Cheng
Proceedings Volume 6924, 69243V (2008) https://doi.org/10.1117/12.771617
KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Optical lithography, Process modeling, Design for manufacturing, Performance modeling, Photomasks, Databases, Environmental sensing

Proceedings Article | 20 October 2006 Paper
Scott Andrews, William Volk, Bo Su, Hong Du, Bhavaniprasad Kumar, Ramanamurthy Pulusuri, Abhishek Vikram, Xiaochun Li, Shaoyun Chen
Proceedings Volume 6349, 634932 (2006) https://doi.org/10.1117/12.694269
KEYWORDS: Inspection, Sensors, Critical dimension metrology, Optical proximity correction, Databases, Lithography, Resolution enhancement technologies, Photomasks, Defect detection, Target detection

Proceedings Article | 20 May 2006 Paper
Bo Su, Melody Ma, Abhishek Vikram, William Volk, Hong Du, Gaurav Verma, Richard Morse, Chih-wei Chu, Becky Tsao, Char Lin, Jacky Chou, Sidney Tsai
Proceedings Volume 6283, 62830Q (2006) https://doi.org/10.1117/12.681851
KEYWORDS: Optical proximity correction, Inspection, Databases, Data modeling, Defect detection, Semiconducting wafers, Lithography, Scanning electron microscopy, Reticles, Process modeling

Proceedings Article | 9 November 2005 Paper
Bo Su, Gaurav Verma, William Volk, Mohsen Ahmadian, Hong Du, Abhishek Vikram, Scott Andrews, Yung Feng Cheng, Yueh Lin Chou, Chuen Huei Yang, ChinLung Lin
Proceedings Volume 5992, 599244 (2005) https://doi.org/10.1117/12.633010
KEYWORDS: Inspection, Databases, Semiconducting wafers, Reticles, Scanning electron microscopy, Optical proximity correction, Calibration, Defect detection, Bridges, Data modeling

Proceedings Article | 7 November 2005 Paper
Mark Laurance, Abhishek Vikram, Melody Ma, William Volk, Melissa Anderson, Scott Andrews, Bo Su, Hong Du, Gaurav Verma
Proceedings Volume 5992, 59921X (2005) https://doi.org/10.1117/12.631877
KEYWORDS: Optical proximity correction, Inspection, Resolution enhancement technologies, Manufacturing, Design for manufacturability, Model-based design, Photomasks, Lithography, Defect inspection, Semiconducting wafers

Proceedings Article | 22 August 2001 Paper
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436796
KEYWORDS: Scanning electron microscopy, Electron beams, Lithography, 3D metrology, Line edge roughness, Polymers, 3D image processing, Imaging technologies, Semiconducting wafers, Photoresist materials

Proceedings Article | 20 April 2001 Paper
Robert Campbell, Bo Su, Terry Seregely, Steve Wallace, Frances Schantz
Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425243
KEYWORDS: Critical dimension metrology, Etching, Semiconducting wafers, Lithography, Process control, Control systems, Reactive ion etching, 3D metrology, Time metrology, Matrices

Proceedings Article | 18 August 2000 Paper
Bo Su, Mina Menaker, Nadav Haas, Ramkumar Subramanian, Bhanwar Singh
Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395714
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Wafer testing, Resolution enhancement technologies, Optical lithography, Printing, Lithography, Scanning electron microscopy, Optimization (mathematics)

Proceedings Article | 2 June 2000 Paper
Bo Su, Ramiel Oshana, Mina Menaker, Yogev Barak, Xuelong Shi
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386476
KEYWORDS: Critical dimension metrology, Process control, Optical lithography, Resolution enhancement technologies, Scanners, Semiconducting wafers, Imaging systems, Etching, Electronic imaging, Lithography

Proceedings Article | 2 June 2000 Paper
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386455
KEYWORDS: Scanning electron microscopy, Electron beams, Semiconducting wafers, Silicon, Metrology, Critical dimension metrology, Process control, Time metrology, Oxides, Signal processing

Proceedings Article | 26 July 1999 Paper
Robert Socha, Xuelong Shi, Ken Holman, Mircea Dusa, Will Conley, John Petersen, J. Fung Chen, Thomas Laidig, Kurt Wampler, Roger Caldwell, M. Chu, Chung Jen Su, Kuei-Chun Hung, C. Chen, F. Wang, C. Le, Christophe Pierrat, Bo Su
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354355
KEYWORDS: Reticles, Photomasks, Phase shifts, Printing, Transmittance, Lithography, Bessel functions, Deep ultraviolet, Chromium, Quartz

Proceedings Article | 11 June 1999 Paper
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350266
KEYWORDS: Diffusion, Optical proximity correction, Optical lithography, Chromium, Chemically amplified resists, Reticles, Deep ultraviolet, Scanning electron microscopy, Diffraction, Chemical reactions

Proceedings Article | 8 June 1998 Paper
Bo Su, K. Rajkumar, Mahesh Agrawal
Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308763
KEYWORDS: Calibration, Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Semiconducting wafers, Silicon, 3D scanning, Metals, Contamination, Switching

Proceedings Article | 7 July 1997 Paper
Mircea Dusa, Bo Su, Stephen Dellarochetta, Terrence Zavecz
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275989
KEYWORDS: Critical dimension metrology, Calibration, Monochromatic aberrations, Scanning electron microscopy, Electron microscopes, Diffraction

Proceedings Article | 7 June 1996 Paper
Mircea Dusa, Stephen Dellarochetta, Allen Fung, Bo Su, Terrence Zavecz
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240922
KEYWORDS: Monochromatic aberrations, Data modeling, Distortion, Critical dimension metrology, Calibration, Scanning electron microscopy, Semiconducting wafers, Error analysis, Overlay metrology, Wavefronts

Showing 5 of 33 publications
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