Dr. Anthony J. Toprac Profile

Dr. Anthony J. Toprac

VP of APC Products at A Toprac Consultancy Inc

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 17 May 2005 Paper

Advanced method for run-to-run control of photolithography overlay registration in high-mix semiconductor production

Anthony Toprac, Yang Wang

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.599733

KEYWORDS: Overlay metrology, Reticles, Optical lithography, Manufacturing, Detection and tracking algorithms, Algorithm development, Semiconducting wafers, Control systems, Semiconductors, Feedback control

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Proceedings Article | 1 July 2003 Paper

Computationally efficient modeling of wafer temperatures in an LPCVD furnace

Qinghua He, S. Joe Qin, Anthony Toprac

Proceedings Volume 5044, (2003) https://doi.org/10.1117/12.485299

KEYWORDS: Semiconducting wafers, Thermal modeling, Low pressure chemical vapor deposition, Chemical elements, Temperature metrology, Data modeling, Quartz, Numerical integration, Chemical vapor deposition, Monte Carlo methods

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Proceedings Article | 23 August 2000 Paper

Adaptive control of multiple product processes

Alexander Pasadyn, Anthony Toprac, Thomas Edgar

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410070

KEYWORDS: Process modeling, Adaptive control, Process control, Control systems, Manufacturing, Chemical mechanical planarization, System identification, Computing systems, Device simulation, Microelectronics

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Proceedings Article | 23 August 2000 Open Access

Lithography overlay controller formulation

Christopher Bode, Anthony Toprac, Richard Edwards, Thomas Edgar

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410061

KEYWORDS: Overlay metrology, Process control, Lithography, Control systems, Manufacturing, Optical alignment, Semiconductor manufacturing, Semiconducting wafers, Feedback control, Process modeling

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Proceedings Article | 3 September 1999 Paper

AMD's advanced process control of poly-gate critical dimension

Anthony Toprac

Proceedings Volume 3882, (1999) https://doi.org/10.1117/12.361324

KEYWORDS: Etching, Critical dimension metrology, Manufacturing, Cadmium, Control systems, Semiconducting wafers, Photoresist materials, Optical lithography, Process control, Data modeling

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Proceedings Article | 3 September 1998 Paper

Chemical rate model for the surface pyrolysis of tetrakis(dimethylamido)titanium to form titanium nitride films

Anthony Toprac, John Iacoponi, Karl Littau

Proceedings Volume 3507, (1998) https://doi.org/10.1117/12.324367

KEYWORDS: Titanium, Data modeling

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Proceedings Article | 25 August 1997 Paper

Model-based control of chemical mechanical polishing

Anthony Toprac

Proceedings Volume 3213, (1997) https://doi.org/10.1117/12.284626

KEYWORDS: Polishing, Semiconducting wafers, Chemical mechanical planarization, Process control, Data modeling, Surface finishing, Process modeling, Silicon, Dielectrics, Manufacturing

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