Chemical rate model for the surface pyrolysis of tetrakis(dimethylamido)titanium to form titanium nitride films

Anthony J. Toprac; John A. Iacoponi; Karl A. Littau

doi:10.1117/12.324367

3 September 1998 Chemical rate model for the surface pyrolysis of tetrakis(dimethylamido)titanium to form titanium nitride films

Anthony J. Toprac, John A. Iacoponi, Karl A. Littau

Author Affiliations +

Proceedings Volume 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV; (1998) https://doi.org/10.1117/12.324367
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States

Abstract

A chemical kinetic rate model for the deposition of titanium nitride films from the surface reaction of tetrakis(dimethyl-amido)titanium (TDMAT) was developed. Without ammonia addition, TDMAT forms a titanium nitride film by pyrolyzing on the hot substrate surface. Experimental data from the applied materials 5000 deposition tool was modeled using a CSTR formulation. With the parameters of the surface reaction model regressed to fit portions of the experimental results, reasonably accurate model predictions over the entire domain of experimental data were obtained.

Citation Download Citation

Anthony J. Toprac, John A. Iacoponi, and Karl A. Littau "Chemical rate model for the surface pyrolysis of tetrakis(dimethylamido)titanium to form titanium nitride films", Proc. SPIE 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV, (3 September 1998); https://doi.org/10.1117/12.324367

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