In this study, we manufactured a 460 mm long deformable mirror which has 28 channel-PZTs on the ellipse pre-figured mirror and flat back surfaces. We evaluated the LTP target ellipse shape measurement result and the "junction" effect by applying voltage to each electrode.

This conference presentation was prepared for SPIE Optics + Photonics, 2023.

The LCLS-II HE Project includes the upgrade of the x-ray beam transport line for DXS, CXI and MFX, which requires an additional 10 bendable mirror systems. For meeting the project demand, the LCLS Metrology Laboratory has added another set of instrumentation to perform stitching measurement using a Zygo 6” DynaFiz (Fizeau interferometer). Prior to the upgrade, the lab has one stitching setup for measuring horizontally facing mirrors, up to 1.5 m long. This new setup enables the measurement of vertically facing mirrors up to 1.2 m long. The measuring systems allow the incorporation of environmental logging as well as control of mirror mechanics such as bender actuators. This means the lab can manipulate two mirror systems and perform the measurements simultaneously, independently and fully automatically. The performance and repeatability of the new instrumentation will be presented. An example measurement of a pair of LCLS mirrors will be discussed.

Recently two-dimensional curved X-ray mirrors such as ellipsoidal and rotational Wolter mirrors have become widely used at synchrotron radiation facilities. Although microstitching interferometry (MSI) can measure surface figures, it takes a long time to obtain surface figure data because of the small field of view for a steeply curved surface. To improve productivity, we are developing a high throughput CGH (Computer Generated Hologram) interferometer system. To fit the CGH wavefront to the mirror surface, we use cylindrical wavefront CGHs for the interferometer system, as part of two-dimensional curved X-ray mirrors that can be approximated by a cylindrical surface. We will give a developing status of our CGH interferometer system.

Increasingly stringent requirements on optical elements needed for the new generation x-ray light sources drive the state of the art in ex situ optical metrology. We present an overview of the ongoing efforts at the ALS to bring the x-ray optics and ex situ metrology to the state-of-the-art level. The challenges of x-ray optics and ex situ metrology we address are shared, and we anticipate that the results of our work will be helpful for further development of the Art of Metrology for X-Ray Optics. This work was supported by the DOE BES under contract number DE-AC02-05CH11231.

The incident power on the 1st optics at a standard undulator beamline of SPring-8 is typically 300W and reach up to 600 W at the maximum. Thermal distortion of the 1st optical elements such as crystals and mirrors affects the wavefront of the beam. For next-generation light sources such as SPring-8-II, proper cooling and element support to reduce distortion of optics is an even more important issue. Therefore we are developing an in-situ metrology to evaluate the deformation of optical surface under heat load. Combining in-situ measurements with simulations, new cooling system has been developed and introduced into beamlines. In this talk, we will introduce some examples of these methods.

Knowledge of optical constants in the vacuum ultraviolet (VUV) range is vital for the semiconductor industries to develop new materials with the required optical properties for lithography. However, the optical constants for most materials in this range are not precisely known because corresponding measurements are demanding in many regards. Measuring the s- and p-polarized reflectance for different materials from 36 nm- 220 nm, we have calculated the optical constants and studied the effect of polarization in the sensitivity of the optical constant determination in the VUV spectral range

We present a single-shot pulse diagnostic system for X-ray free-electron lasers (XFELs) using a speckle-correlation scattering matrix (SSM). Characterization of pulse shapes is crucial for the wide range of applications in XFELs. However, single-shot field characterization in XFELs has remained challenging due to the stochastic nature of self-amplified stimulated emission. Our method demonstrates robust field retrieval performance regardless of the incident field properties. We have proven the robustness of the method by successfully reconstructing fields in various experimental configurations.

With the nearly full spatial coherence of X-ray free electron lasers comes unprecedented requirements on the precise figure of X-ray mirrors. For example, the Time-resolved AMO Instrument (TMO) requires a bendable Kirkpatrick-Baez (KB) mirror system in order to produce a range of focus spot sizes, while maintaining nm-level figure error across the corresponding range of elliptical shapes. Here we describe the process of TMO KB mirror characterization using optical metrology, the detailed comparison with at-wavelength wavefront sensors during instrument commissioning, and the implementation of an automatic focusing system that ties together the wavefront sensor output with the mirror bender controls.