CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume PC12695 > Article
Presentation
4 October 2023 Investigating the sensitivity of optical constant determination in the vacuum ultraviolet spectral range to s- and p-polarized reflectance
Najmeh Abbasirad, Udo Kroth, Qais Saadeh, Richard Ciesielski, Alexander Gottwald, Vicky Philipsen, Frank Scholze, Victor Soltwisch, Mattia Mulazzi
Author Affiliations +
Proceedings Volume PC12695, Advances in Metrology for X-Ray and EUV Optics X; PC1269507 (2023) https://doi.org/10.1117/12.2681821
Event: SPIE Optical Engineering + Applications, 2023, San Diego, California, United States
Abstract
Knowledge of optical constants in the vacuum ultraviolet (VUV) range is vital for the semiconductor industries to develop new materials with the required optical properties for lithography. However, the optical constants for most materials in this range are not precisely known because corresponding measurements are demanding in many regards. Measuring the s- and p-polarized reflectance for different materials from 36 nm- 220 nm, we have calculated the optical constants and studied the effect of polarization in the sensitivity of the optical constant determination in the VUV spectral range
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Najmeh Abbasirad, Udo Kroth, Qais Saadeh, Richard Ciesielski, Alexander Gottwald, Vicky Philipsen, Frank Scholze, Victor Soltwisch, and Mattia Mulazzi "Investigating the sensitivity of optical constant determination in the vacuum ultraviolet spectral range to s- and p-polarized reflectance", Proc. SPIE PC12695, Advances in Metrology for X-Ray and EUV Optics X, PC1269507 (4 October 2023); https://doi.org/10.1117/12.2681821
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Vacuum ultraviolet
Reflectivity
Absorption
Polarization
Reflectance spectroscopy
Refractive index
Semiconductor manufacturing
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top