Marcel Mastenbroek
at ASML Netherlands B.V.
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 16 November 2022 Presentation
Proceedings Volume PC12292, PC1229202 (2022) https://doi.org/10.1117/12.2644629
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205103 (2022) https://doi.org/10.1117/12.2614220
KEYWORDS: Critical dimension metrology, Control systems, High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic

Proceedings Article | 30 September 2021 Presentation
Proceedings Volume 11854, 1185404 (2021) https://doi.org/10.1117/12.2600961
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic, Critical dimension metrology, Control systems

Proceedings Article | 22 February 2021 Presentation
Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, Roderik Van Es
Proceedings Volume 11609, 1160908 (2021) https://doi.org/10.1117/12.2583992
KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Stochastic processes, Scanners, Overlay metrology, Logic, Lithography, Critical dimension metrology

Proceedings Article | 22 September 2020 Presentation
Proceedings Volume 11517, 1151703 (2020) https://doi.org/10.1117/12.2572356
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Logic devices, Manufacturing, Scanners, Lithography, Logic, Overlay metrology, Critical dimension metrology, Stochastic processes

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11147, 1114703 (2019) https://doi.org/10.1117/12.2532110
KEYWORDS: High volume manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Logic, Pellicles, Lithography, Semiconducting wafers, Critical dimension metrology, Stochastic processes

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10809, 1080904 (2018) https://doi.org/10.1117/12.2502785
KEYWORDS: Lithography, Scanners, Extreme ultraviolet lithography, High volume manufacturing, Pellicles, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 20 March 2018 Presentation + Paper
Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Alexander Padi, Chia-Wei Hung, Hsiao-Lan Chen, Laurens van Bokhoven, Niels Lammers, Jean Phillippe van Damme, Floris Teeuwisse, Robin Tijssen, Wilson Tzeng, Cathy Wang, Marcel Mastenbroek, Harald Vos, Ting-Ju Yueh, Miao-Chi Chen , Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen , Kevin Cheng, John Lin
Proceedings Volume 10587, 1058709 (2018) https://doi.org/10.1117/12.2297387
KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

Showing 5 of 8 publications
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