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Dr. Zoey Meng
at Univ of California Santa Barbara
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Author
Publications (4)
Proceedings Article | 22 November 2023 Presentation
Sequence-defined polypeptoids as DUV and EUV chemically amplified resists
Cameron Adams, Xiangxi Meng, Florian Kaefer, Chenyun Yuan, Christopher Ober, Rachel Segalman
Proceedings Volume PC12750, PC127500J (2023) https://doi.org/10.1117/12.2688477
KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Chemically amplified resists, Extreme ultraviolet lithography, Polymers, Optical lithography, Chemical composition, Switches, Stochastic processes, Solubility
Proceedings Article | 1 May 2023 Presentation + Paper
Photoresists with precisely controlled molecular weight, composition, and sequence
Proceedings Volume 12498, 124980F (2023) https://doi.org/10.1117/12.2658582
KEYWORDS: Photoresist materials, Polymers, Stochastic processes, Solubility, Chemical composition, Lithography, Polymerization, Nitrogen, Extreme ultraviolet lithography
Proceedings Article | 1 May 2023 Presentation + Paper
Sequence-defined polypeptoid CARs for electron-beam and EUV lithography
Proceedings Volume 12498, 1249817 (2023) https://doi.org/10.1117/12.2658413
KEYWORDS: Lithography, Extreme ultraviolet lithography, Solubility, Polymers, Solids, Photoacid generators, Extreme ultraviolet, Electron beam lithography, Chemical composition, Switching
Proceedings Article | 1 December 2022 Poster + Paper
Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists
Proceedings Volume 12292, 122920Q (2022) https://doi.org/10.1117/12.2642965
KEYWORDS: Polymers, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Deep ultraviolet, Switches, Standards development, Polymer thin films
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