Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists

X. Zoey Meng; Florian H. Käfer; Gregory M. Wallraff; Christopher K. Ober; Rachel A. Segalman

doi:10.1117/12.2642965

1 December 2022 Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists

X. Zoey Meng, Florian H. Käfer, Gregory M. Wallraff, Christopher K. Ober, Rachel A. Segalman

Proceedings Volume 12292, International Conference on Extreme Ultraviolet Lithography 2022; 122920Q (2022) https://doi.org/10.1117/12.2642965
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Conference Poster

Abstract

Achieving commercial viability for extreme ultraviolet lithography (EUVL) demands a homogeneous polymeric materials platform for fine pattern microelectronics. However, current polymer systems possess a heterogeneity length scale larger than the 13.5 nm range desired for EUVL leading to line-edge roughness close to the size of a single polymer molecule in less than a nanometer. In this report, we develop polypeptoids in a high-yielding polymer synthesis with low stochastics and enable a high sensitivity environmentally stable chemically amplified photoresist (ESCAP) for large-scale manufacturing using DUV/EUVL. Polypeptoids are bio-inspired, sequence-defined polymers that minimize molecular size and compositional and sequence statistics. Functional monomers, such as photosensitizers, solubility switches, etchresistant units, and Tg modulators, have been programmed to be precisely distributed into the polymer structure using a robotic synthesizer. Positive-tone polypeptoids ESCAPs can thus be tuned via chemical and sequence design. In particular, the arrangement of solubility-switch functional groups relative to adhesion-promoting groups influences synthetic yield and lithographic patternability. Other functional groups, such as phenolic and aromatic, promote a resist’s physical properties, film quality, adhesive characteristics, and pattern development by tuning the polymer’s polarity, depending on the sequence within the polymer chain. This work bridges the materials design of bioinspired polymers, high throughput manufacturing techniques, and nanolithography enabling polymer uses with high processing fidelity for nanotechnologies.

Citation Download Citation

X. Zoey Meng, Florian H. Käfer, Gregory M. Wallraff, Christopher K. Ober, and Rachel A. Segalman "Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists", Proc. SPIE 12292, International Conference on Extreme Ultraviolet Lithography 2022, 122920Q (1 December 2022); https://doi.org/10.1117/12.2642965

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