CONFERENCE PROCEEDINGS
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Prof. Yi-Chang Lu
at National Taiwan Univ
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Author
Publications (5)
SPIE Journal Paper | 22 August 2018
Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems
JM3, Vol. 17, Issue 03, 031202, (August 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.031202
KEYWORDS: Computer programming, Electron beam direct write lithography, Raster graphics, Electron beam lithography, Image compression, Logic, Detection and tracking algorithms, Semiconducting wafers, Data compression, Data processing
SPIE Journal Paper | 11 August 2015
Efficient layout data compression algorithm and its low-complexity, high-performance hardware decoder implementation for multiple electron-beam direct-write systems
Chin-Khai Tang, Ming-Shing Su, Yi-Chang Lu
JM3, Vol. 14, Issue 03, 031212, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031212
KEYWORDS: Electron beam lithography, Data compression, Computer programming, Clocks, Lutetium, Stereolithography, Electroluminescence, Data centers, Data processing, Field programmable gate arrays
Proceedings Article | 3 April 2010 Paper
Architecture for next-generation massively parallel maskless lithography system (MPML2)
Proceedings Volume 7637, 76371Q (2010) https://doi.org/10.1117/12.846444
KEYWORDS: Semiconducting wafers, Maskless lithography, Lithography, Photomasks, Data processing, Manufacturing, Electron beams, Data centers, Lenses, Microelectromechanical systems
SPIE Journal Paper | 1 April 2009
Development of 2.4-GHz film bulk acoustic wave filter for wireless communication
Chi-Ming Fang, Shih-Yung Pao, Chi-Yuan Lee, Yi-Chang Lu, Pei-Yen Chen, Yung-Chung Chin, Pei-Zen Chang
JM3, Vol. 8, Issue 02, 021121, (April 2009) https://doi.org/10.1117/12.10.1117/1.3094749
KEYWORDS: Acoustics, Wireless communications, Resonators, Device simulation, Image filtering, Radio frequency circuits, Circuit switching, Electrodes, Roads, Signal attenuation
Proceedings Article | 21 March 2007 Paper
Impacts of optical proximity correction settings on electrical performances
Proceedings Volume 6521, 65210W (2007) https://doi.org/10.1117/12.711850
KEYWORDS: Transistors, Optical proximity correction, Device simulation, Image segmentation, Critical dimension metrology, Semiconducting wafers, Lithography, Resolution enhancement technologies, Manufacturing, Design for manufacturability
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