Mr. Werner Saule Profile

Werner Saule

at HamaTech AG

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 8 November 2005 Paper

Investigation of sulfate-free clean processes for next generation lithography

Christian Chovino, Stefan Helbig, Petr Haschke, Werner Saule

Proceedings Volume 5992, 59923E (2005) https://doi.org/10.1117/12.632055

KEYWORDS: Scanning probe microscopy, Photomasks, Particles, Chemistry, Hydrogen, Reflectivity, Ozone, Crystals, Contamination, Lithography

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Proceedings Article | 20 August 2004 Paper

Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback

Lothar Berger, Werner Saule, Peter Dress, Thomas Gairing, C.-J. Chen, Hsin-Chang Lee, Hung-Chang Hsieh

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557714

KEYWORDS: Photomasks, Calibration, Temperature metrology, Sensors, Critical dimension metrology, Temperature sensors, Sensor calibration, Optimization (mathematics), Chemically amplified resists, Inspection

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Proceedings Article | 28 August 2003 Paper

Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks

Christian Buergel, Werner Saule, M. Strobl, Peter Dress, Anatol Schwersenz, Martin Tschinkl

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504190

KEYWORDS: Photomasks, Standards development, Inspection, Image processing, Photoresist processing, Critical dimension metrology, Chemically amplified resists, Scanning electron microscopy, 3D image processing, Silver

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Proceedings Article | 5 September 2001 Paper

Improved baking of photomasks by a dynamically zone-controlled process approach

Peter Dress, Thomas Gairing, Werner Saule, Uwe Dietze, Jakob Szekeresch

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438353

KEYWORDS: Temperature metrology, Photomasks, Sensors, Chemically amplified resists, Copper, Control systems, Thin film coatings, Photoresist processing, Critical dimension metrology, Algorithm development

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