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The influence of the measurement devices (wireless and wired sensor arrays) used to optimize the hotplate, on the performance of the Post Exposure Bake (PEB) process is discussed in [1,2]. A concept of utilizing two wired sensor arrays, with wire connections attached in opposite locations on the sensor array surface, called “Mirror Bake” is introduced. Based on the individual hotplate optimization for each of those two sensor arrays, a combined bake recipe for the multi-zone hotplate is calculated. This method eliminates the systematic temperature non-uniformity introduced by the sensor array hardware, when optimizing the recipes with only one sensor array.
In this paper the “mirror bake” concept is validated by comparing the CD uniformity data of masks manufactured with a PEB process, optimized using a single standard sensor array vs. the “mirror bake” concept. The “mirror bake” concept achieved a CD uniformity improvement of up to 30% (CD range). During this work additional hardware influences from the sensor arrays were identified.
Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
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