Dr. Weiming Ren
Fellow at ASML
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 20 March 2020 Paper
Eric Ma, Weiming Ren, Xinan Luo, Shuo Zhao, Xuerang Hu, Xuedong Liu, Chiyan Kuan, Kevin Chou, Martijn Maassen, Weihua Yin, Aiden Chen, Niladri Sen, Martin Ebert, Lei Liu, Fei Wang, Oliver Patterson
Proceedings Volume 11325, 113250F (2020) https://doi.org/10.1117/12.2553556
KEYWORDS: Inspection, Semiconducting wafers, Electrons, Optical inspection, Defect detection, System integration, Defect inspection, Image processing, Image quality standards, Semiconductor manufacturing

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770D (2019) https://doi.org/10.1117/12.2536565
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Electron beams, Defect inspection, Optical inspection, Signal detection, Sensors, Computer architecture, Defect detection

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109591R (2019) https://doi.org/10.1117/12.2515272
KEYWORDS: Inspection, Defect detection, Optical inspection, Photomasks, Semiconducting wafers, Image quality, Extreme ultraviolet, Computing systems, Semiconductors, Semiconductor manufacturing

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10810, 1081014 (2018) https://doi.org/10.1117/12.2503857
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Defect inspection, Wafer inspection, Scanning electron microscopy, Computing systems, Extreme ultraviolet lithography

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 1058535 (2018) https://doi.org/10.1117/12.2323183
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Image processing, Semiconducting wafers, Computing systems, Semiconductors, Image quality, Scanning electron microscopy

Showing 5 of 12 publications
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