Dr. Theodore Cacouris Profile

Dr. Theodore Cacouris

Product Marketing Director at Cymer LLC

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Publications (12)

Proceedings Article | 21 March 2018 Paper

DUV light source sustainability achievements and next steps

Yzzer Roman, Ted Cacouris, Kumar Raja Guvindan Raju, Dinesh Kanawade, Walt Gillespie, Siqi Luo, Eric Mason, David Manley, Saptaparna Das

Proceedings Volume 10587, 1058716 (2018) https://doi.org/10.1117/12.2299387

KEYWORDS: Light sources, Neon, Deep ultraviolet, Carbon, Metals, Semiconducting wafers, Helium, Semiconductors, Nitrogen

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Proceedings Article | 20 March 2018 Presentation

Advanced light source technologies for memory and logic processes (Conference Presentation)

Theodore Cacouris, Josh Thornes, Marc Sells, Aleks Simic, Will Conley

Proceedings Volume 10587, 105870Y (2018) https://doi.org/10.1117/12.2298431

KEYWORDS: Light sources, Logic, Deep ultraviolet, Optical lithography, Immersion lithography, 3D metrology, Photomasks

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Proceedings Article | 30 March 2017 Paper

Next-generation DUV light source technologies for 10nm and below

Ted Cacouris, Greg Rechtsteiner, Will Conley

Proceedings Volume 10147, 1014718 (2017) https://doi.org/10.1117/12.2260319

KEYWORDS: Light sources, Deep ultraviolet, Lithography, Optical lithography, Process control, Photomasks, Excimer lasers, Immersion lithography, Critical dimension metrology, Optical proximity correction, Scanners, Beam shaping, Data modeling

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Proceedings Article | 15 March 2016 Paper

Neon reduction program on Cymer ArF light sources

Dinesh Kanawade, Yzzer Roman, Ted Cacouris, Josh Thornes, Kevin O'Brien

Proceedings Volume 9780, 97801H (2016) https://doi.org/10.1117/12.2219942

KEYWORDS: Neon, Light sources, Excimer lasers, Chemical elements, Lithography, Excimers, Deep ultraviolet, Semiconductors, Halogens, Fluorine, Molybdenum

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Proceedings Article | 15 March 2016 Paper

Means to improve light source productivity: from proof of concept to field implementation

E. Rausa, T. Cacouris, W. Conley, M. Jackson, S. Luo, S. Murthy, G. Rechtsteiner, K. Steiner

Proceedings Volume 9780, 97801G (2016) https://doi.org/10.1117/12.2219940

KEYWORDS: Light sources, Excimer lasers, Data analysis, Gases, Lithography, Error analysis, Molybdenum, Laser scanners, 3D scanning, Neodymium, Scanners, Manufacturing, Ions

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Proceedings Article | 18 March 2015 Paper

New ArF immersion light source introduces technologies for high-volume 14nm manufacturing and beyond

T. Cacouris, W. Conley, J. Thornes, T. Bibby, J. Melchior, T. Aggarwal, E. Gross

Proceedings Volume 9426, 942618 (2015) https://doi.org/10.1117/12.2085968

KEYWORDS: Light sources, Helium, Lithography, Optical lithography, Deep ultraviolet, Critical dimension metrology, Control systems, Manufacturing, Molybdenum, Semiconductors

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Proceedings Article | 12 April 2013 Paper

High power 120W ArF immersion XLR laser system for high dose applications

R. Rokitski, R. Rafac, J. Melchior, R. Dubi, J. Thornes, T. Cacouris, M. Haviland, D. Brown

Proceedings Volume 8683, 86831H (2013) https://doi.org/10.1117/12.2012681

KEYWORDS: Light sources, Laser systems engineering, Semiconducting wafers, Optical lithography, Lithography, Time metrology, Deep ultraviolet, Amplifiers, Excimer lasers, Reliability

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Proceedings Article | 13 March 2012 Paper

Advanced light source technologies that enable high-volume manufacturing of DUV lithography extensions

Theodore Cacouris, Rajasekhar Rao, Rostislav Rokitski, Rui Jiang, John Melchior, Bernd Burfeindt, Kevin O'Brien

Proceedings Volume 8326, 83261G (2012) https://doi.org/10.1117/12.917827

KEYWORDS: Light sources, Lithography, Metrology, Deep ultraviolet, Double patterning technology, Optical lithography, Optical testing, Light, Neodymium, High volume manufacturing

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Proceedings Article | 4 March 2010 Paper

High reliability ArF light source for double patterning immersion lithography

Rostislav Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7640, 76401Q (2010) https://doi.org/10.1117/12.849065

KEYWORDS: Light sources, Double patterning technology, Reliability, Immersion lithography, Electrodes, Lithography, Scanners, Deep ultraviolet, Optical proximity correction, Excimer lasers

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Proceedings Article | 11 December 2009 Paper

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Slava Rokitski, Toshi Ishihara, Rajeskar Rao, Rui Jiang, Daniel Riggs, Mary Haviland, Theodore Cacouris, Daniel Brown

Proceedings Volume 7520, 752013 (2009) https://doi.org/10.1117/12.839803

KEYWORDS: Light sources, Double patterning technology, Control systems, Scanners, Immersion lithography, Lithography, Deep ultraviolet, Polarization, Optical proximity correction, High volume manufacturing

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Proceedings Article | 16 March 2009 Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rostislav Rokitski, Vladimir Fleurov, Robert Bergstedt, Hong Ye, Robert Rafac, Robert Jacques, Fedor Trintchouk, Toshihiko Ishihara, Rajasekhar Rao, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

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Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

Proceedings Article | 17 March 2008 Paper

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, Hong Ye, Kevin O’Brien, Robert Jacques, Fedor Trintchouk, Efrain Figueroa, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 6924, 69241R (2008) https://doi.org/10.1117/12.776927

KEYWORDS: Double patterning technology, Light sources, Immersion lithography, Control systems, Scanners, Excimer lasers, Pulsed laser operation, Laser scanners, 3D scanning, Semiconducting wafers

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Showing 5 of 12 publications

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