Dr. Susan C. Palmateer Profile

Dr. Susan C. Palmateer

Director, FPA Foundry at BAE Systems

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Author

Publications (9)

Proceedings Article | 14 June 1999 Paper

Metrology methods for quantifying edge roughness: II

Carla Nelson-Thomas, Susan Palmateer, Anthony Forte, Susan Cann, S. Deneault, Theodore Lyszczarz

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350860

KEYWORDS: Scanning electron microscopy, Atomic force microscopy, Silicon, Edge roughness, Semiconducting wafers, Metrology, Line edge roughness, Spatial frequencies, Critical dimension metrology, Time metrology

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Proceedings Article | 29 June 1998 Paper

Line-edge roughness in sub-0.18-um resist patterns

Susan Palmateer, Susan Cann, Jane Curtin, Scott Doran, Lynn Eriksen, Anthony Forte, Roderick Kunz, Theodore Lyszczarz, Margaret Stern, Carla Nelson-Thomas

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312395

KEYWORDS: Line edge roughness, Etching, Plasma etching, Plasma, Silicon, Reticles, Image processing, Image quality, Photoresist processing, Scanning electron microscopy

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Proceedings Article | 8 June 1998 Paper

Metrology methods for the quantification of edge roughness

Carla Nelson-Thomas, Susan Palmateer, Theodore Lyszczarz

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308735

KEYWORDS: Scanning electron microscopy, Edge roughness, Atomic force microscopy, Reticles, Critical dimension metrology, Metrology, Oxides, Semiconducting wafers, Line edge roughness, Spatial frequencies

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Proceedings Article | 14 June 1996 Paper

Limits to etch resistance for 193-nm single-layer resists

Roderick Kunz, Susan Palmateer, Anthony Forte, Robert Allen, Gregory Wallraff, Richard Di Pietro, Donald Hofer

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241835

KEYWORDS: Etching, Polymers, Resistance, Plasma, Chemistry, Metals, Semiconducting wafers, Plasma etching, Deep ultraviolet, Photoresist processing

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Proceedings Article | 8 April 1996 Paper

193-nm lithography (Review Paper)

Mordechai Rothschild, Anthony Forte, Mark Horn, Roderick Kunz, Susan Palmateer, Jan Sedlacek

Proceedings Volume 2703, (1996) https://doi.org/10.1117/12.237751

KEYWORDS: Lithography, Absorption, Etching, Photoresist materials, Polymers, Excimer lasers, Silica, Projection systems, Photoresist processing, Color centers

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Proceedings Article | 9 June 1995 Paper

All-dry resist processes for 193-nm lithography

Mark Horn, Brian Maxwell, Roderick Kunz, Michael Hibbs, Lynn Eriksen, Susan Palmateer, Anthony Forte

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210368

KEYWORDS: Polymers, Plasma enhanced chemical vapor deposition, Lithography, Photoresist materials, Photoresist processing, Chemistry, Silicon, Plasma, Photoresist developing, Etching

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Proceedings Article | 9 June 1995 Paper

Optimization of a 193-nm silylation process for sub-0.25-um lithography

Susan Palmateer, Roderick Kunz, Mark Horn, Anthony Forte, Mordechai Rothschild

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210356

KEYWORDS: Etching, Semiconducting wafers, Photoresist processing, Lithography, Photomasks, Imaging systems, Image processing, Plasma etching, Scanning electron microscopy, Silicon

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Proceedings Article | 9 November 1993 Paper

Monolithic optoelectronic transistor: a new optical neuron device

Brian Aull, Elliott Brown, Paul Maki, Kirby Nichols, Susan Palmateer, Thomas Lind

Proceedings Volume 2026, (1993) https://doi.org/10.1117/12.163588

KEYWORDS: Modulators, Field effect transistors, Switching, Optoelectronics, Sensors, Transistors, Neural networks, Switches, Neurons, Resistance

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Proceedings Article | 16 February 1993 Paper

Development of GaInAsP/GaAs strained-layer quantum-well diode lasers

Steven Groves, Zong-Long Liau, Susan Palmateer, James Walpole, Leo Missaggia

Proceedings Volume 1788, (1993) https://doi.org/10.1117/12.141096

KEYWORDS: Gallium arsenide, Quantum wells, Indium gallium phosphide, Waveguides, Semiconductor lasers, Indium gallium arsenide, Sensors, Cladding, Semiconducting wafers, Laser damage threshold

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Showing 5 of 9 publications

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