Dr. Steffen Steinert
Project Manager at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 21 November 2023 Poster + Paper
Richard van Haren, Steffen Steinert, Orion Mouraille, Oktay Yildirim, Jan Hermans, Leon van Dijk, Dirk Beyer
Proceedings Volume 12751, 127511A (2023) https://doi.org/10.1117/12.2687307
KEYWORDS: Overlay metrology, Metrology, Image registration, Semiconducting wafers, Zoom lenses, Scanning electron microscopy, Scanners, Optical alignment, Environmental sensing

Proceedings Article | 1 December 2022 Presentation + Paper
Richard van Haren, Steffen Steinert, Orion Mouraille, Ewa Kasperkiewicz, Jan Hermans, Mahmudul Hasan, Leon van Dijk, Dirk Beyer
Proceedings Volume 12293, 122930L (2022) https://doi.org/10.1117/12.2641618
KEYWORDS: Photomasks, Semiconducting wafers, Logic, Image registration, Overlay metrology, Scanners, Metrology, Scanning electron microscopy, Optical alignment, Logic devices

Proceedings Article | 1 November 2022 Paper
Michael Haberler, Peter Hudek, Michal Jurkovic, Elmar Platzgummer, Christoph Spengler, Lena Bachar, Steffen Steinert, Hui-Wen Lu-Walther, Dirk Beyer
Proceedings Volume 12472, 124720L (2022) https://doi.org/10.1117/12.2641517
KEYWORDS: Image registration, Calibration, Photomasks, Metrology, Overlay metrology, Electron beams, Extreme ultraviolet lithography, Distortion, Semiconductors

Proceedings Article | 12 October 2020 Poster + Paper
Richard van Haren, Steffen Steinert, Orion Mouraille, Jan Hermans, Leon van Dijk, Dirk Beyer
Proceedings Volume 11518, 1151813 (2020) https://doi.org/10.1117/12.2573190
KEYWORDS: Overlay metrology, Photomasks, Scanners, Optical alignment, Reticles, Logic, Sensors, Diffraction, Etching, Metrology

Proceedings Article | 26 September 2019 Paper
Richard van Haren, Steffen Steinert, Orion Mouraille, Koen D'havé, Leon van Dijk, Jan Hermans, Dirk Beyer
Proceedings Volume 11148, 1114811 (2019) https://doi.org/10.1117/12.2536270
KEYWORDS: Optical alignment, Semiconducting wafers, Reticles, Scanners, Overlay metrology, Photomasks, Image registration, Sensors

Showing 5 of 11 publications
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