Dr. Peter Hudek
at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Websites:
Publications (22)

SPIE Journal Paper | 10 February 2024 Open Access
Mathias Tomandl, Christoph Spengler, Peter Hudek, Christof Klein, Hans Loeschner, Elmar Platzgummer
JM3, Vol. 23, Issue 01, 011205, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011205
KEYWORDS: Extreme ultraviolet, Distortion, Lenses, Nanofabrication, Industry, Magnetism, Industrial applications, Lithography, Extreme ultraviolet lithography, Projection systems

Proceedings Article | 1 November 2022 Paper
Michael Haberler, Peter Hudek, Michal Jurkovic, Elmar Platzgummer, Christoph Spengler, Lena Bachar, Steffen Steinert, Hui-Wen Lu-Walther, Dirk Beyer
Proceedings Volume 12472, 124720L (2022) https://doi.org/10.1117/12.2641517
KEYWORDS: Image registration, Calibration, Photomasks, Metrology, Overlay metrology, Electron beams, Extreme ultraviolet lithography, Distortion, Semiconductors

SPIE Journal Paper | 28 October 2021
Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi
JM3, Vol. 20, Issue 04, 041402, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041402
KEYWORDS: Photomasks, Extreme ultraviolet, Point spread functions, Photoresist processing, Extreme ultraviolet lithography, Scattering, Monte Carlo methods, Lithography, Electron beam lithography, Backscatter

Proceedings Article | 22 February 2021 Presentation
Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi
Proceedings Volume 11610, 116100T (2021) https://doi.org/10.1117/12.2584588
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Scattering, Point spread functions, Photoresist processing, Numerical simulations, Lithography, Chemically amplified resists

Proceedings Article | 12 November 2018 Presentation + Paper
Ingo Bork, Peter Buck, Christian Bürgel, Bhardwaj Durvasula, Stefan Eder-Kapl, Peter Hudek, Michal Jurkovic, Jan Klikovits, Elmar Platzgummer, Jed Rankin, Rao Nageswara, Murali Reddy, Christoph Spengler
Proceedings Volume 10810, 108100K (2018) https://doi.org/10.1117/12.2503284
KEYWORDS: Photomasks, SRAF, Calibration, Cadmium, Lithography, Double patterning technology, Data modeling, Etching, Vestigial sideband modulation, Scanning electron microscopy

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 1003205 (2016) https://doi.org/10.1117/12.2247941
KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, SRAF, Inspection, Metals, Optics manufacturing, Scanning electron microscopy, Logic, Lithography

Proceedings Article | 26 September 2016 Paper
Proceedings Volume 9985, 99850R (2016) https://doi.org/10.1117/12.2243407
KEYWORDS: Photomasks, SRAF, Optical proximity correction, Logic, Manufacturing, Metals, Inspection, Image processing, Information operations, Scanning electron microscopy

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 965805 (2015) https://doi.org/10.1117/12.2196388
KEYWORDS: Photomasks, Metrology, Image registration, Nanofabrication, Calibration, Reticles, Beam shaping, Manufacturing, Lithography, Model-based design

Proceedings Article | 17 May 2013 Paper
Gabriel Vanko, Peter Hudek, Johann Zehetner, Jaroslav Dzuba, Pavlina Choleva, Martin Vallo, Ivan Rýger, Tibor Lalinský
Proceedings Volume 8763, 87632U (2013) https://doi.org/10.1117/12.2017499
KEYWORDS: Silicon carbide, Sensors, Microelectromechanical systems, Heterojunctions, Laser ablation, Bulk micromachining, Silicon, Gallium nitride, Field effect transistors, Etching

Proceedings Article | 28 March 2008 Paper
L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber
Proceedings Volume 6921, 69211S (2008) https://doi.org/10.1117/12.772472
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography

Proceedings Article | 27 January 2005 Paper
San-De Tzu, Chung-Hsing Chang, Wen-Chi Chen, Karl-Heinz Kliem, Peter Hudek, Dirk Beyer
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577008
KEYWORDS: Photomasks, Critical dimension metrology, Mask making, Opacity, Etching, Phase measurement, Lithography, Line edge roughness, Scattering, Inspection

Proceedings Article | 20 August 2004 Paper
Mathias Irmscher, Dirk Beyer, Joerg Butschke, Peter Hudek, Corinna Koepernik, Jason Plumhoff, Emmanuel Rausa, Mitsuru Sato, Peter Voehringer
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557686
KEYWORDS: Etching, Opacity, Photoresist processing, Chromium, Scattering, Electron beam lithography, Photomasks, Optical lithography, Calibration, Chemically amplified resists

Proceedings Article | 2 June 2004 Paper
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568035
KEYWORDS: Electron beam lithography, Lithography, Photomasks, Photoresist processing, Etching, Chromium, Beam shaping, Nanotechnology, Image processing, Semiconducting wafers

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518043
KEYWORDS: Opacity, Mask making, Electron beam lithography, Photoresist processing, Etching, Chemically amplified resists, Optical proximity correction, Line edge roughness, Photomasks, Scattering

Proceedings Article | 28 August 2003 Paper
Mathias Irmscher, Lothar Berger, Dirk Beyer, Joerg Butschke, Peter Dress, Thomas Hoffmann, Peter Hudek, Corinna Koepernik, Martin Tschinkl, Peter Voehringer
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504185
KEYWORDS: Photomasks, Etching, Coating, Mask making, Chemically amplified resists, Binary data, Line edge roughness, Photoresist processing, Optical proximity correction, Scanning electron microscopy

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467495
KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Semiconducting wafers, Standards development, Scanning electron microscopy, Lithography, Metrology, Manufacturing, Chromium

Proceedings Article | 27 December 2002 Paper
Corinna Koepernik, Dirk Beyer, Peter Dress, Thomas Hoffmann, Peter Hudek, Mathias Irmscher, Christian Krauss, Bernd Leibold, Dietmar Mueller, Christian Reuter, Reinhard Springer, Jakob Szekeresch, Peter Voehringer
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467424
KEYWORDS: Coating, Photoresist processing, Mask making, Chemically amplified resists, Photomasks, Electron beam lithography, Capillaries, Binary data, Critical dimension metrology, Etching

Proceedings Article | 11 March 2002 Paper
Dirk Beyer, Dirk Loeffelmacher, Gernot Goedl, Peter Hudek, Bernd Schnabel, Thomas Elster
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458252
KEYWORDS: Photomasks, Monochromatic aberrations, Etching, Electron beam lithography, Lithography, Critical dimension metrology, Beam shaping, Dry etching, Monte Carlo methods, Photoresist processing

Proceedings Article | 5 June 1998 Paper
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309629
KEYWORDS: Electron beam lithography, Temperature metrology, Lithography, Critical dimension metrology, Beam shaping, Computing systems, Distortion, Photomasks, Photoresist processing, Electron beams

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275800
KEYWORDS: Electron beam lithography, Critical dimension metrology, Distortion, Laser scattering, Scattering, Computing systems, Lithography, Electron beams, 3D modeling, Software development

Proceedings Article | 23 September 1996 Paper
Peter Hudek, Ivo Rangelow, Ivan Kostic, Piotr Grabiec, Feng Shi
Proceedings Volume 2879, (1996) https://doi.org/10.1117/12.251206
KEYWORDS: Etching, Silicon, Reactive ion etching, Photoresist processing, Electron beam lithography, Plasma, Plasma etching, Lithography, Photomasks, Deep ultraviolet

Proceedings Article | 23 September 1996 Paper
Ivo Rangelow, Feng Shi, Peter Hudek, Teodor Gotszalk, Piotr Grabiec, Piotr Dumania
Proceedings Volume 2879, (1996) https://doi.org/10.1117/12.251232
KEYWORDS: Silicon, Etching, Sensors, Atomic force microscopy, Photoresist materials, Plasma etching, Semiconducting wafers, Plasma, Wheatstone bridges, Resistors

Showing 5 of 22 publications
Conference Committee Involvement (3)
ASDAM 2012 the 9th Int'l Conf. on Advanced Semiconductor Devices and Microsystems
11 November 2012 |
MNE 2012
16 September 2012 |
MNE 2011
19 September 2011 |
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