Dr. Roland Fuessl
at Technische Univ Ilmenau
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 23 March 2020 Paper
Ingo Ortlepp, Michael Kühnel, Martin Hofmann, Laura Weidenfeller, Johannes Kirchner, Shraddha Supreeti, Rostyslav Mastylo, Mathias Holz, Thomas Michels, Roland Füßl, Ivo Rangelow, Thomas Fröhlich, Denis Dontsov, Christoph Schäffel, Eberhard Manske
Proceedings Volume 11324, 113240A (2020) https://doi.org/10.1117/12.2551044
KEYWORDS: Interferometers, Nanofabrication, Mirrors, Actuators, Near field optics, Control systems, Manufacturing, Nanotechnology, Physics, Atomic force microscopy

Proceedings Article | 21 June 2019 Presentation + Paper
Eberhard Manske, Thomas Fröhlich, Roland Füßl, Rostyslav Mastylo, Ulrike Blumröder, Paul Köchert, Oliver Birli, Ingo Ortlepp, Christof Pruß, Folker Schwesinger, Andreas Meister
Proceedings Volume 11056, 110560L (2019) https://doi.org/10.1117/12.2526076
KEYWORDS: Metrology, Interferometers, Frequency combs, Helium neon lasers, Mirrors, Precision measurement, Sensors, Laser metrology, Sensor technology, Optics manufacturing

Proceedings Article | 19 March 2018 Presentation + Paper
Ivo Rangelow, Claudia Lenk , Martin Hofmann , Steve Lenk , Tzvetan Ivanov , Ahmad Ahmad , Marcus Kaestner, Elshad Guliyev, Christoph Reuter, Matthias Budden, Jens-Peter Zöllner, Mathias Holz , Alexander Reum, Zahid Durrani, Mervyn Jones, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Michael Kuehnel, Thomas Fröhlich, Roland Fuessl, E. Manske
Proceedings Volume 10584, 1058406 (2018) https://doi.org/10.1117/12.2299955
KEYWORDS: Silicon, Lithography, Etching, Scanning probe lithography, Cryogenics, Optical alignment, Nanoelectronics, Reactive ion etching, Nanolithography, Electron beam lithography

Proceedings Article | 26 March 2013 Paper
Nataliya Vorbringer-Doroshovets, Felix Balzer, Roland Fuessl, Eberhard Manske, Marcus Kaestner, Andreas Schuh, Jens-Peter Zoellner, Manuel Hofer, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov , Ivo Rangelow
Proceedings Volume 8680, 868018 (2013) https://doi.org/10.1117/12.2012324
KEYWORDS: Scanning probe lithography, Lithography, Atomic force microscopy, Nanoelectronics, Optical lithography, Silicon, Inspection, Scanners, Optical alignment, Photomasks

Proceedings Article | 22 May 2009 Paper
Proceedings Volume 7378, 737816 (2009) https://doi.org/10.1117/12.821794
KEYWORDS: Metrology, Interferometers, Scanning probe microscopy, Monte Carlo methods, Beam splitters, Mirrors, Scanning probe microscopes, Distance measurement, Thermal modeling, Calibration

Showing 5 of 9 publications
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