Rajul Randive
Director Applications Engineering at Crystal IS Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 27 May 2009 Paper
Patrick Kearney, C. C. Lin, Takashi Sugiyama, Henry Yun, Rajul Randive, Ira Reiss, Alan Hayes, Paul Mirkarimi, Eberhard Spiller
Proceedings Volume 7470, 74700X (2009) https://doi.org/10.1117/12.835195
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Inspection, Extreme ultraviolet, Deposition processes, Particles, Manufacturing, Ions

Proceedings Article | 17 October 2008 Paper
A. Hayes, R. Randive, I. Reiss, J. Menendez, P. Kearney, T. Sugiyama
Proceedings Volume 7122, 71223O (2008) https://doi.org/10.1117/12.801870
KEYWORDS: Particles, Photomasks, Aluminum, Contamination, Extreme ultraviolet, Chromium, Electrodes, Silicon, Iron, Particle contamination

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69211X (2008) https://doi.org/10.1117/12.774505
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Extreme ultraviolet, Manufacturing, Particles, Inspection, Ions, Deposition processes

Proceedings Article | 3 May 2007 Paper
Chan-Uk Jeon, Patrick Kearney, Andy Ma, Bernd Beier, Toshyuki Uno, Rajul Randive, Ira Reiss
Proceedings Volume 6533, 653310 (2007) https://doi.org/10.1117/12.737160
KEYWORDS: Particles, Etching, Photomasks, Silicon, Extreme ultraviolet lithography, Ion beams, Coating, Multilayers, Ions, Atomic force microscopy

Proceedings Article | 15 March 2007 Paper
Proceedings Volume 6517, 651726 (2007) https://doi.org/10.1117/12.712103
KEYWORDS: Particles, Etching, Silicon, Photomasks, Extreme ultraviolet lithography, Ion beams, Atomic force microscopy, Ions, Inspection, Coating

SPIE Journal Paper | 1 April 2006
JM3, Vol. 5, Issue 02, 023003, (April 2006) https://doi.org/10.1117/12.10.1117/1.2198853
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Particles, Reflectivity, Silicon, Ions, Ion beams, Quartz

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617477
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Coating, Multilayers, Reflectivity, Particles, Ions, Silicon, Molybdenum, Quartz

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599936
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Coating, Reflectivity, Particles, Silicon, Ions, Molybdenum, Lithography

Proceedings Article | 6 December 2004 Paper
Patrick Kearney, Rajul Randive, Andy Ma, David Krick, Al Weaver, Ira Reiss, Daniel Abraham, Paul Mirkarimi, E. Spiller
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569271
KEYWORDS: Multilayers, Extreme ultraviolet lithography, Inspection, Photomasks, Coating, Reflectivity, Deposition processes, Defect detection, Defect inspection, Quartz

Proceedings Article | 17 December 2003 Paper
Andy Ma, Kevin Kemp, Rajul Randive, Al Weaver, Mark Roberti, Alan Hayes, Daniel Abraham, Paul Mirkarimi, Eberhard Spiller, Patrick Kearney
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.535866
KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Multilayers, Silicon, Coating, Quartz, Ions, Ion beams

Showing 5 of 10 publications
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