Overcoming substrate defect decoration effects in EUVL mask blank development

Patrick A. Kearney; Rajul V. Randive; Andy Ma; David Krick; Al Weaver; Ira Reiss; Daniel Abraham; Paul B. Mirkarimi; E. Spiller

doi:10.1117/12.569271

6 December 2004 Overcoming substrate defect decoration effects in EUVL mask blank development

Patrick A. Kearney, Rajul V. Randive, Andy Ma, David Krick, Al Weaver, Ira Reiss, Daniel Abraham, Paul B. Mirkarimi, E. Spiller

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569271
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

Mask blanks for extreme ultraviolet lithography (EUVL) are fabricated by depositing Mo/Si multilayer films on 6” square super polished substrates. These mask blanks must be almost defect-free and development of a suitable multiplayer deposition tool and process is crucial for the commercialization of EUVL. We will show that using current, real-world quartz substrates and our state-of-the-art defect inspection tool, that substrate defect decoration is an obstacle; this means that there appear to be many non-detectable substrate defects that become detectable once a reflective coating is deposited. This makes it very challenging to conduct accurate defect root cause analysis experiments. We have overcome this obstacle: it entails characterizing an already coated substrate for defects, which provides a suitable reference from which to measure the defects in the multilayer coating that is subsequently applied. We will demonstrate that this is a viable technique and that it enables a suitable defect baseline to be obtained; this is crucial to performing accurate root cause analysis experiments for potential defect sources/mechanisms.

Citation Download Citation

Patrick A. Kearney, Rajul V. Randive, Andy Ma, David Krick, Al Weaver, Ira Reiss, Daniel Abraham, Paul B. Mirkarimi, and E. Spiller "Overcoming substrate defect decoration effects in EUVL mask blank development", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569271

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available