Mr. Pan Zhang Profile

Pan Zhang

at Peking Univ

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Author

Publications (3)

Proceedings Article | 31 March 2014 Paper

A generalized edge-placement yield model for the cut-hole patterning process

Pan Zhang, Chuyang Hong, Yijian Chen

Proceedings Volume 9052, 90521Q (2014) https://doi.org/10.1117/12.2046437

KEYWORDS: Critical dimension metrology, Phase only filters, Optical lithography, Overlay metrology, Error analysis, Cadmium, Lithography, Yield improvement, Statistical modeling

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Proceedings Article | 12 April 2013 Paper

A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling

Yijian Chen, Weiling Kang, Pan Zhang

Proceedings Volume 8683, 86830Z (2013) https://doi.org/10.1117/12.2010582

KEYWORDS: Optical lithography, Etching, Photomasks, Scanners, Carbon, Phase only filters, Lithography, Process modeling, Failure analysis, Logic

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Proceedings Article | 29 March 2013 Paper

Cut-process overlay yield model for self-aligned multiple patterning and a misalignment correction technique based on dry etching

Pan Zhang, Yijian Chen

Proceedings Volume 8685, 86850K (2013) https://doi.org/10.1117/12.2010584

KEYWORDS: Etching, Phase only filters, Optical lithography, Dry etching, Extreme ultraviolet, Photomasks, Failure analysis, Yield improvement, Overlay metrology, Lithography

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