Dr. Naoto Horiguchi
at imec
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12958, 129580B (2024) https://doi.org/10.1117/12.3014213
KEYWORDS: Etching, Optical lithography, Polymers, Semiconducting wafers, Plasma etching, Passivation, Lithography, Plasma, Dry etching, Wafer testing

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12499, 1249909 (2023) https://doi.org/10.1117/12.2659095
KEYWORDS: Etching, Optical lithography, Lithography, Plasma etching, Plasma, Dry etching, Critical dimension metrology, Dielectrics

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume PC12499, PC1249901 (2023) https://doi.org/10.1117/12.2662840
KEYWORDS: Optical lithography, CMOS devices, Etching, System on a chip, Metals, Field effect transistors, Dielectrics, Control systems

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205608 (2022) https://doi.org/10.1117/12.2615984
KEYWORDS: Optical lithography, Etching, Dielectrics, Silicon, Metals, Wafer bonding, Transistors, Surface roughness, Semiconducting wafers, Photomasks

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12056, PC1205604 (2022) https://doi.org/10.1117/12.2613723
KEYWORDS: Field effect transistors, Etching, Dry etching, Very large scale integration, Isotropic etching, Dielectrics, Gallium arsenide, Transistors, Superlattices, Sodium

Proceedings Article | 26 May 2022 Presentation + Paper
Gaetano Santoro, Kevin Houchens, Janusz Bogdanowicz, Moshe Elizov, Lior Yaron, Michael Chemama, Alex Goldenshtein, Amit Zakay, Noam Amit, Basoene Briggs, Antoine Pacco, Romain Delhougne, Andrew Cockburn, Yaniv Abramovitz, Aviram Tam, Ofer Adan, Hans Mertens, Anne-Laure Charley, Naoto Horiguchi, Philippe Leray, Gian Francesco Lorusso
Proceedings Volume 12053, 120530L (2022) https://doi.org/10.1117/12.2613771
KEYWORDS: Transmission electron microscopy, Metrology, Scanning electron microscopy, Metals, 3D metrology, Molybdenum, Tin, Semiconducting wafers, Signal to noise ratio, Process control

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12056, 120560C (2022) https://doi.org/10.1117/12.2616731
KEYWORDS: Etching, Metals, Plasma etching, Optical lithography, Ruthenium, Plasma, Tin, Dielectrics, Dry etching, Molybdenum

Proceedings Article | 25 May 2022 Presentation + Paper
A. Gupta, Z. Tao, D. Radisic, H. Mertens, O. Varela Pedreira, S. Demuynck, J. Bömmels, K. Devriendt, N. Heylen, S. Wang, K. Kenis, L. Teugels, F. Sebaai, C. Lorant, N. Jourdan, B. Chan, S. Subramanian, F. Schleicher, A. Peter, N. Rassoul, Y. Siew, B. Briggs, D. Zhou, E. Rosseel, E. Capogreco, G. Mannaert, A. Sepúlveda, E. Dupuy, K. Vandersmissen, B. Chehab, G. Murdoch, E. Altamirano Sanchez, S. Biesemans, Zs. Tőkei, E. Dentoni Litta, N. Horiguchi
Proceedings Volume 12056, 120560B (2022) https://doi.org/10.1117/12.2615641
KEYWORDS: Ruthenium, Metals, Molybdenum, Etching, Tungsten, Front end of line, Chemical mechanical planarization, Silicon

Proceedings Article | 22 April 2021 Presentation + Paper
Bilal Chehab, Julien Ryckaert, Pieter Schuddinck, Pieter Weckx, Naoto Horiguchi, Gioele Mirabelli, Alessio Spessot, Myunghee Na
Proceedings Volume 11614, 116140D (2021) https://doi.org/10.1117/12.2583395
KEYWORDS: Back end of line, Standards development, Metals, Field effect transistors, Multiplexers, Logic, Fin field effect transistors, Dielectrics, Control systems, Clocks

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290Q (2020) https://doi.org/10.1117/12.2550539
KEYWORDS: Silicon, Fin field effect transistors, Gallium arsenide, Critical dimension metrology, Plasma, Field effect transistors, Etching, Line edge roughness, Line width roughness, Transistors

Proceedings Article | 20 March 2020 Paper
Takeyoshi Ohashi, Kazuhisa Hasumi, Masami Ikota, Gian Lorusso, Liesbeth Witters, Naoto Horiguchi
Proceedings Volume 11325, 1132525 (2020) https://doi.org/10.1117/12.2552193
KEYWORDS: Germanium, Metrology, Field effect transistors, Inspection, Scanning electron microscopy, Silicon, Semiconducting wafers, Electron beams

SPIE Journal Paper | 4 April 2019 Open Access
JM3, Vol. 18, Issue 02, 021205, (April 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.021205
KEYWORDS: Inspection, Scanning electron microscopy, Capacitance, Resistance, Nanowires, Field effect transistors, Silicon, Transmission electron microscopy, Selenium, Semiconducting wafers

Proceedings Article | 20 March 2019 Paper
N. Collaert, A. Alian, B. De Jaeger, U. Peralagu, A. Vais, A. Walke, L. Witters, H. Yu, E. Capogreco, K. Devriendt, T. Hopf, K. Kenis, G. Mannaert, A. Milenin, A. Peter, F. Sebaai, L. Teugels, D. van Dorp, K. Wostyn, N. Horiguchi, N. Waldron
Proceedings Volume 10963, 1096305 (2019) https://doi.org/10.1117/12.2511746
KEYWORDS: Germanium, Gallium nitride, Gallium arsenide, CMOS technology, Field effect transistors, Fin field effect transistors, Group III-V semiconductors

Proceedings Article | 19 March 2018 Presentation
Anne-Laure Charley, Hans Mertens, Naoto Horiguchi , Philippe Leray, Nivea Figueiró, Matthew Sendelbach, Roy Koret, Avron Ger, Shay Wolfling
Proceedings Volume 10585, 1058505 (2018) https://doi.org/10.1117/12.2300972
KEYWORDS: Scatterometry, Nanowires, Gallium arsenide, Metrology, Silicon, Etching, Transmission electron microscopy, Logic, Heart

Proceedings Article | 13 March 2018 Paper
Takeyoshi Ohashi, Atsuko Yamaguchi, Kazuhisa Hasumi, Masami Ikota, Gian Lorusso, Naoto Horiguchi
Proceedings Volume 10585, 105850B (2018) https://doi.org/10.1117/12.2296992
KEYWORDS: Inspection, Scanning electron microscopy, Capacitance, Resistance, Nanowires, Field effect transistors, Transmission electron microscopy, Semiconducting wafers

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105850M (2018) https://doi.org/10.1117/12.2297464
KEYWORDS: Reflectometry, Reflectivity, Extreme ultraviolet, Silicon, Coherence imaging, Cameras, Stereoscopy, 3D image processing, 3D metrology, Profiling

Proceedings Article | 28 March 2017 Presentation + Paper
Gian Francesco Lorusso, Takeyoshi Ohashi, Astuko Yamaguchi, Osamu Inoue, Takumichi Sutani, Naoto Horiguchi, Jürgen Bömmels, Christopher Wilson, Basoene Briggs, Chi Lim Tan, Tom Raymaekers, Romain Delhougne, Geert Van den Bosch, Luca Di Piazza, Gouri Sankar Kar, Arnaud Furnémont, Andrea Fantini, Gabriele Luca Donadio, Laurent Souriau, Davide Crotti, Farrukh Yasin, Raf Appeltans, Siddharth Rao, Danilo De Simone, Paulina Rincon Delgadillo, Philippe Leray, Anne-Laure Charley, Daisy Zhou, Anabela Veloso, Nadine Collaert, Kazuhisa Hasumi, Shunsuke Koshihara, Masami Ikota, Yutaka Okagawa, Toru Ishimoto
Proceedings Volume 10145, 1014512 (2017) https://doi.org/10.1117/12.2257468
KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, 3D metrology, Back end of line, Logic, Standards development, Germanium, Algorithm development, Process control, Resistance, Overlay metrology, Oxides, Etching, Statistical analysis

Proceedings Article | 27 March 2017 Presentation + Paper
Toby Hopf, Monique Ercken, Geert Mannaert, Eddy Kunnen, Zheng Tao, Nadia Vandenbroeck, Farid Sebaai, Yoshiaki Kikuchi, Hans Mertens, Stefan Kubicek, Steven Demuynck, Naoto Horiguchi
Proceedings Volume 10146, 1014618 (2017) https://doi.org/10.1117/12.2257668
KEYWORDS: Optical lithography, System on a chip, Carbon, Photoresist materials, Etching, Lithography, Front end of line, Silicon, Photomasks

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97781T (2016) https://doi.org/10.1117/12.2218496
KEYWORDS: Scanning transmission electron microscopy, Semiconducting wafers, Transmission electron microscopy, CMOS sensors, Metrology, Semiconductors, Edge detection, 3D metrology, Electron microscopes

Proceedings Article | 23 March 2016 Paper
N. Horiguchi, A. Milenin, Z. Tao, H. Hubert, E. Altamirano-Sanchez, A. Veloso, L. Witters, N. Waldron, L.-Å. Ragnarsson, M. S. Kim, Y. Kikuchi, H. Mertens, P. Raghavan, D. Piumi, N. Collaert, K. Barla, A. Thean
Proceedings Volume 9782, 978209 (2016) https://doi.org/10.1117/12.2220605
KEYWORDS: Optical lithography, Field effect transistors, Nanowires, Etching, Silicon, Metals, Isotropic etching, Dielectrics, Germanium

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 942406 (2015) https://doi.org/10.1117/12.2087099
KEYWORDS: Transmission electron microscopy, Silica, Silicon, Metrology, Edge detection, Electron microscopes, Image filtering, Calibration, Scanning electron microscopy

Proceedings Article | 17 April 2014 Paper
Arindam Mallik, Naoto Horiguchi, Jürgen Bömmels, Aaron Thean, Kathy Barla, Geert Vandenberghe, Kurt Ronse, Julien Ryckaert, Abdelkarim Mercha, Laith Altimime, Diederik Verkest, An Steegen
Proceedings Volume 9048, 90481R (2014) https://doi.org/10.1117/12.2046310
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers, Semiconductors, Photomasks, Back end of line, Metals, Front end of line

Proceedings Article | 8 April 2013 Paper
Arindam Mallik, Wim Vansumere, Julien Ryckaert, Abdelkarim Mercha, Naoto Horiguchi, Steven Demuynck, Jürgen Bömmels, Tokei Zsolt, Geert Vandenberghe, Kurt Ronse, Aaron Thean, Diederik Verkest, Hans Lebon, An Steegen
Proceedings Volume 8679, 86792Y (2013) https://doi.org/10.1117/12.2011528
KEYWORDS: Semiconducting wafers, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Optical lithography, Semiconductors, Databases, Back end of line, 193nm lithography

Showing 5 of 23 publications
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