Mr. Nader M. Hindawy Profile

Nader M. Hindawy

at Siemens EDA

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Publications (1)

Proceedings Article | 13 March 2009 Paper

Implementing a framework to generate a unified OPC database from different EDA vendors for 45nm and beyond

Shady Abdelwahed, Mohamed Al-Iman, Rami Fathy, Nader Hindawy, Jochen Schacht, Regina Shen, Chia Wei Huang, Pei Ru Tsai, Te Hung Wu, Chuen Huei Yang

Proceedings Volume 7275, 72751O (2009) https://doi.org/10.1117/12.816281

KEYWORDS: Optical proximity correction, Electronic design automation, Photomasks, Semiconducting wafers, Data modeling, SRAF, Visualization, Wafer-level optics, Databases, Lithography

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