Mr. Muhamad Faiz Bin Abd Malek Profile

Muhamad Faiz Bin Abd Malek

at Silterra Malaysia Sdn Bhd

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Proceedings Article | 26 May 2022 Poster + Paper

Pattern based automation of ETest gauge checks for MDP

Nur Ameera Ameelia Binti Iskandar Zulkarnain, Jason Sweis, Ezni Aznida Binti Kamal Baharin, Mohamad Fahmi bin Muhsain, Muhamad Asraf bin Ahmad Ibrahim, Muhamad Faiz bin Abd Malek

Proceedings Volume 12052, 1205215 (2022) https://doi.org/10.1117/12.2606175

KEYWORDS: Photomasks, Metrology, Wafer testing, Semiconductor manufacturing, Semiconducting wafers, Visualization, Target recognition, Pattern recognition, Optical inspection, Manufacturing

Read Abstract +

In the mask data preparation (MDP) flow, it is necessary to verify that layout structures are correctly placed and that specific critical dimensions (CDs) are correct. Certain layout versions of Electrical Test (ETest) structures are placed throughout various locations of the frame data which will be sent for fracture and mask production. Within each ETest structure, there are many sub-structures and gauge points where we want to verify dimensions and locations in the post fractured data. The current preparation flow being employed is error-prone and time-consuming, considering that the entire verification process is done manually. To address this issue, we have utilized a novel pattern search methodology that can measure and report gauge locations relative to unique identifier pattern locations which can all be reviewed graphically on the actual mask data. A full inspection point kit is first generated by a developer using automation scripts which allow graphical gauge definitions relative to a unique identifier pattern per ETest location. A revision-controlled pattern library is created to define the test patterns to be measured based on the technology product. A user can then take this kit and run all post-fracture reporting of ETest structures per tape-out. Correspondence with the mask shop is also simplified and discrepancies are easily verified. In this paper, we will discuss in greater detail how this pattern-based approach and the utilization of pattern libraries help us in significantly reducing the possible errors and verification time. We will also review how the entire process which includes the location measurement and the reporting structure to the mask shop can be fully automated, hence, improving the productivity and the turn-around-time for the mask manufacturing process.

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