Dr. Mitsuaki Amemiya Profile

Dr. Mitsuaki Amemiya

at Canon Inc

SPIE Involvement:

Author

Publications (13)

SPIE Journal Paper | 27 February 2012

Particle protection capability of extreme ultraviolet lithography mask carriers based on the gap effect and filter effect

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

JM3, Vol. 11, Issue 1, 013002, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013002

KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

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Proceedings Article | 8 April 2011 Paper

Evaluation results of a new EUV reticle pod having reticle grounding paths

Kazuya Ota, Masami Yonekawa, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga

Proceedings Volume 7969, 79691V (2011) https://doi.org/10.1117/12.879553

KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Electrodes, Photomasks, Particle contamination, Resistance, Dielectric polarization

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SPIE Journal Paper | 1 January 2011

Study of electrification of extreme ultraviolet lithography mask and adhesion of particles during electrostatic chucking

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

JM3, Vol. 10, Issue 1, 013002, (January 2011) https://doi.org/10.1117/12.10.1117/1.3532835

KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection

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Proceedings Article | 27 May 2010 Paper

Study on counting error in particle inspection

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7748, 77481B (2010) https://doi.org/10.1117/12.867929

KEYWORDS: Particles, Inspection, Signal detection, Photomasks, Error analysis, Extreme ultraviolet lithography, Strontium, Nickel, Laser scattering, Scattering

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Proceedings Article | 18 March 2009 Paper

Experimental evaluation of particulate contamination on backside of EUV reticle

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, Naosuke Nishimura, Osamu Suga

Proceedings Volume 7271, 72713M (2009) https://doi.org/10.1117/12.812952

KEYWORDS: Particles, Reticles, Optical spheres, Carbon, Extreme ultraviolet, Silicon carbide, Interferometers, Quartz, Photovoltaics, Extreme ultraviolet lithography

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Proceedings Article | 18 March 2009 Paper

Experimental study of particle-free mask handling

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7271, 72713G (2009) https://doi.org/10.1117/12.813371

KEYWORDS: Particles, Photomasks, Electrodes, Quartz, Resistance, Extreme ultraviolet lithography, Extreme ultraviolet, Latex, Inspection, Defect detection

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Proceedings Article | 19 May 2008 Paper

Selete EUV reticle shipping and storage test results

Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga

Proceedings Volume 7028, 70280I (2008) https://doi.org/10.1117/12.793025

KEYWORDS: Reticles, Particles, Inspection, Extreme ultraviolet, Photomasks, Humidity, Pellicles, Quartz, Data storage, Extreme ultraviolet lithography

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Proceedings Article | 3 April 2008 Paper

Particle-free mask handling techniques and a dual-pod carrier

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Takashi Kamono, Youichi Usui, Tadahiko Takikawa, Osamu Suga

Proceedings Volume 6921, 69213T (2008) https://doi.org/10.1117/12.771569

KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Inspection, Error analysis, Particle contamination, Reticles, Protactinium, Pellicles, Absorption

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Proceedings Article | 21 March 2008 Paper

Experimental evaluation of out-of-plane distortion of electrostatically chucked EUV reticle

Kazuya Ota, Takao Taguchi, Mitsuaki Amemiya, Yasushi Nishiyama, Takashi Kamono, Naosuke Nishimura, Tadahiko Takikawa, Youichi Usui, Osamu Suga

Proceedings Volume 6921, 69213S (2008) https://doi.org/10.1117/12.771339

KEYWORDS: Reticles, Particles, Carbon, Extreme ultraviolet, Quartz, Distortion, Silicon carbide, Interferometers, Photovoltaics, Semiconducting wafers

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Proceedings Article | 15 May 2007 Paper

Development of a novel EUV mask protection engineering tool and mask handling techniques

Mitsuaki Amemiya, Kazuya Ota, Takashi Kamono, Hiroyoshi Kubo, Youichi Usui, Tadahiko Takikawa, Takao Taguchi, Osamu Suga

Proceedings Volume 6607, 66073G (2007) https://doi.org/10.1117/12.729035

KEYWORDS: Particles, Photomasks, Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Atmospheric particles, Contamination, Quartz, Protactinium

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Proceedings Article | 20 March 2007 Paper

Development of EUV mask handling technology at MIRAI-Selete

Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, Takashi Kamono, Hiroyoshi Kubo, Tadahiko Takikawa, Yoichi Usui, Osamu Suga

Proceedings Volume 6517, 65171Z (2007) https://doi.org/10.1117/12.711317

KEYWORDS: Photomasks, Particles, Extreme ultraviolet, Inspection, Pellicles, Interferometers, Defect detection, Time metrology, Laser applications, Manufacturing

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Proceedings Article | 16 June 2003 Paper

LPP-based reflectometer for characterization of EUV lithography systems

Akira Miyake, Takeshi Miyachi, Mitsuaki Amemiya, Takayuki Hasegawa, Nobuaki Ogushi, Takeshi Yamamoto, Fumitaro Masaki, Yutaka Watanabe

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484969

KEYWORDS: Mirrors, Reflectivity, Light sources, Reflectometry, Monochromators, Extreme ultraviolet, Polarizers, Charge-coupled devices, Beam splitters, Extreme ultraviolet lithography

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Proceedings Article | 28 July 1997 Paper

Current status of the SR stepper development

Nobutoshi Mizusawa, Yutaka Watanabe, Shinichi Hara, Kenji Saitoh, Hiroshi Maehara, Mitsuaki Amemiya, Shunichi Uzawa

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277256

KEYWORDS: Photomasks, Lithography, Distortion, Prototyping, Semiconducting wafers, Optical alignment, Printing, Helium, Manufacturing, Critical dimension metrology

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Showing 5 of 13 publications

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