Mr. Masanobu Honda Profile

Masanobu Honda

Vice President at Tokyo Electron Miyagi Ltd

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Publications (7)

Proceedings Article | 30 April 2023 Presentation

Challenges and innovations in EUV patterning: lithography and etch outlook

Eric Liu, Akiteru Ko, Sophie Thibaut, Katie Lutker-Lee, Steven Grzeskowiak, Alexandra Krawicz, Christopher Cole, Hamed Hajibabaei, Sergey Voronin, Nayoung Bae, Angelique Raley, Lior Huli, Kanzo Kato, David Hetzer, Kathleen Nafus, Seiji Fujimoto, Seiji Nagahara, Satoru Shimura, Shinichiro Kawakami, Congque Dinh, Yuhei Kuwahara, Shigeru Tahara, Masanobu Honda, Tetsuya Nishizuka, Peter Biolsi, Hiromasa Mochiki

Proceedings Volume PC12499, PC124990H (2023) https://doi.org/10.1117/12.2659720

KEYWORDS: Etching, Optical lithography, Lithography, Extreme ultraviolet, Plasma etching, Plasma, Transistors, Semiconducting wafers, Photoresist processing, Photochemistry

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Proceedings Article | 25 May 2022 Presentation + Paper

Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges

Angélique Raley, Lior Huli, Steven Grzeskowiak, Katie Lutker-Lee, Alexandra Krawicz, Yannick Feurprier, Eric Liu, Kanzo Kato, Kathleen Nafus, Arnaud Dauendorffer, Nayoung Bae, Josh LaRose, Andrew Metz, Dave Hetzer, Masanobu Honda, Tetsuya Nishizuka, Akiteru Ko, Soichiro Okada, Yasuyuki Ido, Tomoya Onitsuka, Shinichiro Kawakami, Seiji Fujimoto, Satoru Shimura, Cong Que Dinh, Makoto Muramatsu, Peter Biolsi, Hiromasa Mochiki, Seiji Nagahara

Proceedings Volume 12056, 120560A (2022) https://doi.org/10.1117/12.2613063

KEYWORDS: Plasma etching, Etching, Extreme ultraviolet, Optical lithography, Plasma, Focus stacking software, Semiconducting wafers, Photoresist processing, Extreme ultraviolet lithography, Silicon carbide

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Proceedings Article | 23 March 2020 Paper

Novel etch technologies utilizing atomic layer process for advanced patterning

Masanobu Honda, Takayuki Katsunuma, Sho Kumakura, Toru Hisamatsu, Yoshihide Kihara

Proceedings Volume 11329, 1132905 (2020) https://doi.org/10.1117/12.2555805

KEYWORDS: Etching, Ions, Silicon carbide, Silicon, Critical dimension metrology, Photomasks, Plasma, Atomic layer deposition, Optical lithography, Plasma etching

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Proceedings Article | 20 March 2019 Presentation + Paper

Integrated atomic scale CD control and local variability reduction techniques

Toru Hisamatsu, Takayuki Katsunuma, Yoshihide Kihara, Masanobu Honda

Proceedings Volume 10963, 109630B (2019) https://doi.org/10.1117/12.2513832

KEYWORDS: Optical lithography, Etching, Critical dimension metrology, Process control, Photomasks, Extreme ultraviolet, Lithography, Logic, Extreme ultraviolet lithography, Multilayers

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Proceedings Article | 27 April 2017 Presentation

Overcoming etch challenges related to EUV based patterning (Conference Presentation)

Andrew Metz, Hongyun Cottle, Masanobu Honda, Shinya Morikita, Kaushik Kumar, Peter Biolsi

Proceedings Volume 10149, 1014906 (2017) https://doi.org/10.1117/12.2258153

KEYWORDS: Photoresist processing, Extreme ultraviolet, Optical lithography, Line edge roughness, Line width roughness, Etching, Plasma etching, Plasma, Process control, Ecosystems

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Proceedings Article | 17 March 2012 Paper

EUV resist curing technique for LWR reduction and etch selectivity enhancement

Kazuki Narishige, Takayuki Katsunuma, Masanobu Honda, Koichi Yatsuda

Proceedings Volume 8328, 83280N (2012) https://doi.org/10.1117/12.916340

KEYWORDS: Extreme ultraviolet, Etching, Line width roughness, Photoresist processing, Plasma, Silicon, Electrodes, Photoresist materials, Polymers, Ions

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Proceedings Article | 16 March 2012 Paper

Patterning enhancement techniques by reactive ion etch

Masanobu Honda, Koichi Yatsuda

Proceedings Volume 8328, 832809 (2012) https://doi.org/10.1117/12.920309

KEYWORDS: Reactive ion etching, Critical dimension metrology, Plasma, Etching, Polymers, Tolerancing, Sulfur, Plasma etching, Carbon monoxide, Image processing

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Showing 5 of 7 publications

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