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Kun Qian
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Author
Publications (5)
Proceedings Article | 15 March 2012 Paper
Variability aware compact model characterization for statistical circuit design optimization
Ying Qiao, Kun Qian, Costas Spanos
Proceedings Volume 8327, 83270J (2012) https://doi.org/10.1117/12.916512
KEYWORDS: Statistical modeling, Data modeling, Transistors, Semiconducting wafers, Monte Carlo methods, Optimization (mathematics), Performance modeling, Process modeling, Device simulation, Manufacturing
Proceedings Article | 19 May 2011 Paper
Collaborative research on emerging technologies and design
Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan
Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394
KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation
Proceedings Article | 3 April 2010 Paper
45nm transistor variability study for memory characterization
Proceedings Volume 7641, 76410G (2010) https://doi.org/10.1117/12.846704
KEYWORDS: Transistors, Semiconducting wafers, Statistical modeling, Device simulation, Instrument modeling, Oscillators, Monte Carlo methods, Statistical analysis, Data modeling, Performance modeling
Proceedings Article | 6 March 2009 Paper
Hierarchical modeling of spatial variability with a 45nm example
Proceedings Volume 7275, 727505 (2009) https://doi.org/10.1117/12.814226
KEYWORDS: Semiconducting wafers, Device simulation, Data modeling, Optical proximity correction, Transistors, Instrument modeling, Statistical analysis, Critical dimension metrology, Light, Oscillators
Proceedings Article | 4 March 2008 Paper
A comprehensive model of process variability for statistical timing optimization
Proceedings Volume 6925, 69251G (2008) https://doi.org/10.1117/12.772980
KEYWORDS: Semiconducting wafers, Process modeling, Oscillators, Lithography, Instrument modeling, Statistical analysis, Optimization (mathematics), Transistors, Statistical modeling, Error analysis
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