Mr. Justin Ghan Profile

Justin Ghan

at ASML

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Author

Publications (6)

Proceedings Article | 19 May 2011 Paper

Collaborative research on emerging technologies and design

Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan

Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394

KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

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Proceedings Article | 23 March 2011 Paper

Simulation-based scanner tuning using FlexRay capability and scatterometry

Karsten Bubke, Matthias Ruhm, Rafael Aldana, Martin Niehoff, Xu Xie, Justin Ghan, Paul van Adrichem, Holger Bald, Paul Luehrmann, Stefan Roling, Rolf Seltmann

Proceedings Volume 7973, 79732E (2011) https://doi.org/10.1117/12.890501

KEYWORDS: Data modeling, Scanners, Scatterometry, Scanning electron microscopy, Metrology, Critical dimension metrology, Semiconducting wafers, Printing, Imaging systems, Cadmium

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Proceedings Article | 23 March 2011 Paper

Scanner matching for standard and freeform illumination shapes using FlexRay

J. Bekaert, L. Van Look, K. D'havé, B. Laenens, G. Vandenberghe, P. van Adrichem, W. Shao, J. Ghan, K. Schreel, J. T. Neumann

Proceedings Volume 7973, 79731I (2011) https://doi.org/10.1117/12.881607

KEYWORDS: Scanners, Fiber optic illuminators, Semiconducting wafers, Photomasks, Reticles, Diffractive optical elements, Cadmium, Critical dimension metrology, Manufacturing, Optical lithography

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Proceedings Article | 13 March 2009 Paper

Algorithm for determining printability and colouring of a target layout for double patterning

Justin Ghan, Apo Sezginer

Proceedings Volume 7275, 72750O (2009) https://doi.org/10.1117/12.814321

KEYWORDS: Double patterning technology, Detection and tracking algorithms, Tolerancing, Spatial frequencies, Lithography, Photomasks, Fourier transforms, Model-based design, Projection lithography, Lithographic illumination

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Proceedings Article | 13 March 2009 Paper

Clustering and pattern matching for an automatic hotspot classification and detection system

Justin Ghan, Ning Ma, Sandipan Mishra, Costas Spanos, Kameshwar Poolla, Norma Rodriguez, Luigi Capodieci

Proceedings Volume 7275, 727516 (2009) https://doi.org/10.1117/12.814328

KEYWORDS: Classification systems, Image classification, Californium, Library classification systems, Databases, Design for manufacturability, Current controlled current source, Lithography, Target detection, Detection and tracking algorithms

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Proceedings Article | 4 March 2008 Paper

Automatic hotspot classification using pattern-based clustering

Ning Ma, Justin Ghan, Sandipan Mishra, Costas Spanos, Kameshwar Poolla, Norma Rodriguez, Luigi Capodieci

Proceedings Volume 6925, 692505 (2008) https://doi.org/10.1117/12.772867

KEYWORDS: Lithography, Image classification, Library classification systems, Detection and tracking algorithms, Failure analysis, Manufacturing, Standards development, Evolutionary algorithms, Visualization, Classification systems

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Showing 5 of 6 publications

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