Kangjoon Seo
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 10 April 2024 Poster + Paper
Donghwan Son, Lanpo He, Masaki Satake, Ying He, Kihun Park, Suhwan Kim, Jing Jiao, Peter Hu, Vikram Tolani, Kangjoon Seo, Kiwoo Jun, Heeyeon Jang, Sujeong Won, Bonseung Koo, Yongwook Lee, Sungha Woo, Euisang Park
Proceedings Volume 12955, 129552N (2024) https://doi.org/10.1117/12.3010196
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Printing, Extreme ultraviolet, Atomic force microscopy, Contour extraction, Binary data, Data processing, Scanners, Extreme ultraviolet lithography

Proceedings Article | 1 April 2013 Paper
Yoonsuk Hyun, Kangjoon Seo, Kyuyoung Kim, Inhwan Lee, Byounghoon Lee, Sunyoung Koo, Jongsu Lee, Sukkyun Kim, Seomin Kim, Myoungsoo Kim, Hyosang Kang
Proceedings Volume 8679, 86790G (2013) https://doi.org/10.1117/12.2010091
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Particles, Extreme ultraviolet, Wafer inspection, Scanners, Reticles, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 26 May 2010 Paper
Kangjoon Seo, MunSik Kim, Sang Chul Kim, JaeCheon Shin, ChangYeol Kim, John Miller, Aditya Dayal, Trent Hutchinson, KiHun Park
Proceedings Volume 7748, 77480N (2010) https://doi.org/10.1117/12.864109
KEYWORDS: Photomasks, Reticles, Inspection, Critical dimension metrology, Reflectivity, Semiconducting wafers, Scanning electron microscopy, Manufacturing, Data processing, Scanners

Proceedings Article | 11 May 2009 Paper
Kang Joon Seo, Ji Sun Ryu, Goo Min Jeong, Shin Cheol Kang, Yong Dae Kim, Sang Chul Kim, Chang Yeol Kim
Proceedings Volume 7379, 73791S (2009) https://doi.org/10.1117/12.824304
KEYWORDS: Pellicles, Photomasks, Air contamination, Transmittance, Contamination, Semiconducting wafers, Lithography, Inspection, Critical dimension metrology, Fluorine

Proceedings Article | 17 October 2008 Paper
Jin Ho Ryu, Kang Joon Seo, Ji Sun Ryu, Chang Yeol Kim
Proceedings Volume 7122, 712215 (2008) https://doi.org/10.1117/12.801433
KEYWORDS: Contamination, Photomasks, Pellicles, Lithography, Air contamination, Quartz, 193nm lithography, Transmittance, Semiconducting wafers, Critical dimension metrology

Showing 5 of 9 publications
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