Jun Xu
at ChangXin Memory Technologies Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 124941H (2023) https://doi.org/10.1117/12.2657250
KEYWORDS: Photoresist materials, Source mask optimization, Reticles, Etching, Light sources and illumination, Optical lithography, Lithography, Image enhancement, Phase shifts, Nanoimprint lithography, Deep ultraviolet

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