Accurate characterisation of transmission lines is essential in enabling the design of Monolithic Microwave Integrated
Circuits (MMICs) or Radio Frequency Integrated Circuits (RFICs). One RFIC technology currently being pursued is
Silicon on Sapphire Complementary Metal Oxide Semiconductor (CMOS) technology. CMOS processes typically
involve stacked metal layer structures and the correct method of modelling coplanar waveguides in CMOS is unclear.
This paper reports on preliminary studies into electromagnetic design, with an emphasis on correctly predicting losses
associated with these structures.
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