Modelling of coplanar waveguide transmission lines in multiple metal layer processes

E. Heading; H. J. Hansen; M. E. Parker

doi:10.1117/12.695676

11 January 2007 Modelling of coplanar waveguide transmission lines in multiple metal layer processes

E. Heading, H. J. Hansen, M. E. Parker

Proceedings Volume 6414, Smart Structures, Devices, and Systems III; 64141R (2007) https://doi.org/10.1117/12.695676
Event: SPIE Smart Materials, Nano- and Micro-Smart Systems, 2006, Adelaide, Australia

Abstract

Accurate characterisation of transmission lines is essential in enabling the design of Monolithic Microwave Integrated Circuits (MMICs) or Radio Frequency Integrated Circuits (RFICs). One RFIC technology currently being pursued is Silicon on Sapphire Complementary Metal Oxide Semiconductor (CMOS) technology. CMOS processes typically involve stacked metal layer structures and the correct method of modelling coplanar waveguides in CMOS is unclear. This paper reports on preliminary studies into electromagnetic design, with an emphasis on correctly predicting losses associated with these structures.

Citation Download Citation

E. Heading, H. J. Hansen, and M. E. Parker "Modelling of coplanar waveguide transmission lines in multiple metal layer processes", Proc. SPIE 6414, Smart Structures, Devices, and Systems III, 64141R (11 January 2007); https://doi.org/10.1117/12.695676

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