Dr. Brian Osborn Profile

Dr. Brian Osborn

Manager at JSR Micro Inc

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Author

Publications (14)

Proceedings Article | 19 March 2012 Paper

Design, synthesis, and characterization of KrF negative developable bottom anti-reflective coating materials

Sen Liu, Kuang-Jung Chen, Wu-Song Huang, Steven Holmes, Karen Huang, Nicolette Fender, Ranee Kwong, Brian Osborn, Cherry Tang, Chung-Hsi Wu, Mark Slezak

Proceedings Volume 8325, 83251B (2012) https://doi.org/10.1117/12.916158

KEYWORDS: Polymers, Reflectivity, Silicon, Semiconducting wafers, Bottom antireflective coatings, Lithography, Chromophores, Critical dimension metrology, Silicon films, Solids

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Proceedings Article | 16 April 2011 Paper

Optimization of pitch-split double patterning photoresist for applications at the 16nm node

Steven Holmes, Cherry Tang, Sean Burns, Yunpeng Yin, Rex Chen, Chiew-seng Koay, Sumanth Kini, Hideyuki Tomizawa, Shyng-Tsong Chen, Nicolette Fender, Brian Osborn, Lovejeet Singh, Karen Petrillo, Guillaume Landie, Scott Halle, Sen Liu, John Arnold, Terry Spooner, Rao Varanasi, Mark Slezak, Matthew Colburn

Proceedings Volume 7972, 79720G (2011) https://doi.org/10.1117/12.881489

KEYWORDS: Photoresist processing, Reactive ion etching, Lithography, Photomasks, Dielectrics, Etching, Scanning electron microscopy, Double patterning technology, Semiconductors, Optical lithography

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Proceedings Article | 26 March 2010 Paper

Process characterization of pitch-split resist materials for application at 16nm node

Steven Holmes, Cherry Tang, John Arnold, Yunpeng Yin, Rex Chen, Nicolette Fender, Brian Osborn, Gary Dabbagh, Sen Liu, Matthew Colburn, Rao Varanasi, Mark Slezak

Proceedings Volume 7639, 76392X (2010) https://doi.org/10.1117/12.846891

KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Double patterning technology, Semiconductors, Photomasks, Reactive ion etching, Silicon, Scanning electron microscopy, Particles

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Proceedings Article | 26 March 2008 Paper

A modified bilayer resist approach for 45 nm flash lithography

Brian Osborn, Gloria Quinto, Cristina Cheung, Fei Wang, Calvin Gabriel, Fred Cheung, Frank Tsai, Anna Minvielle

Proceedings Volume 6923, 69230Y (2008) https://doi.org/10.1117/12.772760

KEYWORDS: Etching, Silicon, Lithography, Photoresist materials, Photomasks, Reflectivity, Optical lithography, Scanning electron microscopy, Line edge roughness, Photoresist developing

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Proceedings Article | 26 March 2008 Paper

KrF bilayer resist defects: cause, analysis, and reduction

Brian Osborn, Gloria Quinto, Zhanping Zhang, Cherry Tang, Stacy Sakai, Go Nagatani, Anna Minvielle

Proceedings Volume 6923, 69232N (2008) https://doi.org/10.1117/12.773118

KEYWORDS: Semiconducting wafers, Photoresist materials, Silicon, Back end of line, Wafer testing, Chemical analysis, Lithography, Optical lithography, Metals, Photoresist processing

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Proceedings Article | 14 May 2004 Paper

Design of dissolution inhibitors for chemically amplified photolithographic systems

Charles Chambers, Shiro Kusumoto, Brian Osborn, Alok Vasudev, Michitaka Ootani, Leonidas Walthal, Hale McMichael, Paul Zimmerman, Willard Conley, C. Grant Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535941

KEYWORDS: Polymers, Distributed interactive simulations, Absorbance, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Picture Archiving and Communication System, Glasses, Transparency, Optical lithography

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Proceedings Article | 12 June 2003 Paper

Dissolution inhibitors for 157-nm photolithography

Charles Chambers, Shiro Kusumoto, Guen Su Lee, Alok Vasudev, Leonidas Walthal, Brian Osborn, Paul Zimmerman, Will Conley, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485191

KEYWORDS: Polymers, Distributed interactive simulations, Semiconducting wafers, Photoresist materials, Carbon monoxide, Carbonates, Optical lithography, Lithography, Absorbance, Fluorine

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Proceedings Article | 12 June 2003 Paper

Negative photoresist for 157-nm microlithography: a progress report

Will Conley, Brian Trinque, Daniel Miller, Stefan Caporale, Brian Osborn, Shiro Kumamoto, Matthew Pinnow, Ryan Callahan, Charles Chambers, Guen Su Lee, Paul Zimmerman, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485194

KEYWORDS: Polymers, Photoresist materials, Transparency, Imaging systems, Spectroscopy, Photomasks, Carbon monoxide, Optical lithography, Binary data, Absorbance

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Proceedings Article | 12 June 2003 Paper

Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report

Iqbal Sharif, Darryl DesMarteau, Larry Ford, Gregory Shafer, Brian Thomas, Will Conley, Paul Zimmerman, Daniel Miller, Guen Su Lee, Charles Chambers, Brian Trinque, Takashi Chiba, Brian Osborn, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485192

KEYWORDS: Polymers, Absorbance, Etching, Transparency, Resistance, Lithography, Imaging systems, Chemistry, Optical lithography, Carbon monoxide

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Proceedings Article | 24 July 2002 Paper

Dissolution inhibitors for 157-nm microlithography

Will Conley, Daniel Miller, Charles Chambers, Brian Osborn, Raymond Hung, Hoang Tran, Brian Trinque, Matthew Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph Dammel, Andrew Romano, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474282

KEYWORDS: Polymers, Absorbance, Photoresist materials, Imaging systems, Lithography, Semiconducting wafers, Transparency, Optical lithography, Vacuum ultraviolet, Phase measurement

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Proceedings Article | 24 July 2002 Paper

Advances in resists for 157-nm microlithography

Brian Trinque, Brian Osborn, Charles Chambers, Yu-Tsai Hsieh, Schuyler Corry, Takashi Chiba, Raymond Hung, Hoang Tran, Paul Zimmerman, Daniel Miller, Will Conley, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474272

KEYWORDS: Polymers, Absorbance, Transparency, Fluorine, Vacuum ultraviolet, Spectroscopy, Phase shifts, Optical lithography, Carbon monoxide, Silica

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Proceedings Article | 24 August 2001 Paper

Dissolution behavior of fluoroalcohol-substituted polystyrenes

Daniel Hall, Brian Osborn, Kyle Patterson, Sean Burns, C. Grant Willson

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436831

KEYWORDS: Polymers, Absorbance, Photoresist materials, Semiconducting wafers, Head-mounted displays, Coating, Liquids, Analog electronics, Magnesium, Nitrogen

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Proceedings Article | 23 June 2000 Paper

Polymers for 157-nm photoresist applications: a progress report

Kyle Patterson, Mikio Yamachika, Raymond Hung, Colin Brodsky, Shintaro Yamada, Mark Somervell, Brian Osborn, Daniel Hall, Gordana Dukovic, Jeff Byers, Will Conley, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388320

KEYWORDS: Photoresist materials, Polymers, Absorbance, Photoresist developing, Transparency, Deep ultraviolet, Etching, Vacuum ultraviolet, Resistance, Fluorine

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Proceedings Article | 23 June 2000 Paper

Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness

Mark Somervell, David Fryer, Brian Osborn, Kyle Patterson, Sungseo Cho, Jeff Byers, C. Grant Willson

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388311

KEYWORDS: Polymers, Line edge roughness, Glasses, Semiconducting wafers, Imaging systems, Etching, FT-IR spectroscopy, Photoresist materials, Image resolution, Absorbance

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Showing 5 of 14 publications

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