Dr. Andy Goodyear Profile

Dr. Andy Goodyear

at Oxford Instruments Plasma Technology Ltd

SPIE Involvement:

Author

Area of Expertise:

Plasma process development , Plasma etching , Plasma deposition , Plasma equipment development , Technology project management

Websites:

Company Website | Personal Website

Publications (8)

SPIE Journal Paper | 21 June 2023

Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

Devesh Thakare, Meiyi Wu, Karl Opsomer, Qais Saadeh, Victor Soltwisch, Philipp Naujok, Christophe Detavernier, Davide Dattilo, Markus Foltin, Andy Goodyear, Mike Cooke, Annelies Delabie, Vicky Philipsen

JM3, Vol. 22, Issue 02, 024403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024403

KEYWORDS: Alloys, Extreme ultraviolet, Tantalum, Nanoimprint lithography, Etching, Oxides, Silicon, Ruthenium, Light sources and illumination, Film thickness

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Proceedings Article | 15 September 2022 Presentation

The EUV mask exposed

Vicky Philipsen, Devesh Thakare, Dongbo Xu, Ling Ee Tan, Jetske Stortelder, Mike Cooke, Andy Goodyear, Victor Soltwisch, Qais Saadeh, Sascha Brose, Andreas Erdmann

Proceedings Volume PC12325, PC123250B (2022) https://doi.org/10.1117/12.2641306

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Proceedings Article | 23 March 2020 Paper

Low damage etching by Inductively Coupled Plasma Reactive Ion Etch (ICP-RIE) and Atomic Layer Etching (ALE) of III-V materials to enable next generation device performance

Mark Dineen, Matthew Loveday, Andy Goodyear, Mike Cooke, Andrew Newton, Stephanie Baclet, Craig Ward, Tania Hemakumara

Proceedings Volume 11329, 113290I (2020) https://doi.org/10.1117/12.2558732

KEYWORDS: Etching, Gallium nitride, Plasma, Semiconducting wafers, Argon, Reactive ion etching, Field effect transistors, Chlorine

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SPIE Journal Paper | 15 July 2015

Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

Marijke Scotuzzi, Martin Kamerbeek, Andy Goodyear, Mike Cooke, Cornelis Hagen

JM3, Vol. 14, Issue 03, 031206, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031206

KEYWORDS: Etching, Silicon, Chemistry, Chlorine, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Electron beams, Plasma

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Proceedings Article | 19 March 2015 Paper

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

M. Scotuzzi, M. Kamerbeek, Andy Goodyear, M. Cooke, C. Hagen

Proceedings Volume 9423, 94230I (2015) https://doi.org/10.1117/12.2085763

KEYWORDS: Etching, Silicon, Chemistry, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Chlorine, Atomic force microscopy, Electron beams

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Proceedings Article | 17 March 2015 Paper

Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr

Andy Goodyear, Monika Boettcher, Ines Stolberg, Mike Cooke

Proceedings Volume 9428, 94280V (2015) https://doi.org/10.1117/12.2085469

KEYWORDS: Etching, Silicon, Semiconducting wafers, Plasma etching, Polymethylmethacrylate, Silica, Chemistry, Chromium, Plasma, Reactive ion etching

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Proceedings Article | 12 May 2004 Paper

ICP etching of InP and related materials using photoresist as mask

Ligang Deng, Goodyear Andrew, Mark Dineen

Proceedings Volume 5280, (2004) https://doi.org/10.1117/12.520922

KEYWORDS: Etching, Photoresist materials, Ions, Electrodes, Semiconducting wafers, Photomasks, Plasma, Chemistry, Plasma systems, Dry etching

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Proceedings Article | 16 September 2002 Paper

Ge-doped film process in waveguide application

Nick Singh, Sean Lee, Chris Hodson, Andy Goodyear, Gary Ditmer, Mike Cooke

Proceedings Volume 4929, (2002) https://doi.org/10.1117/12.483242

KEYWORDS: Annealing, Silica, Germanium, Waveguides, Plasma enhanced chemical vapor deposition, Refractive index, Silicon, Semiconducting wafers, Electrodes, Plasma

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Showing 5 of 8 publications

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