Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications

Ritva A. M. Keski-Kuha; John F. Osantowski; Douglas B. Leviton; Timo T. Saha; Geraldine A. Wright; Rene A. Boucarut; Charles M. Fleetwood; Timothy J. Madison

doi:10.1117/1.601128

1 January 1997 Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications

Ritva A. M. Keski-Kuha, John F. Osantowski, Douglas B. Leviton, Timo T. Saha, Geraldine A. Wright, Rene A. Boucarut, Charles M. Fleetwood, Timothy J. Madison

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Optical Engineering, Vol. 36, Issue 1, (January 1997). https://doi.org/10.1117/1.601128

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of chemical vapor deposited (CVD) SiC mirrors provides an opportunity to extend the range of normal-incidence instruments down to 60 nm. CVD SiC is a highly polishable material yielding low-scattering surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors, as well as some strengths and problem areas, is discussed.

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Ritva A. M. Keski-Kuha, John F. Osantowski, Douglas B. Leviton, Timo T. Saha, Geraldine A. Wright, Rene A. Boucarut, Charles M. Fleetwood, and Timothy J. Madison "Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications," Optical Engineering 36(1), (1 January 1997). https://doi.org/10.1117/1.601128

Published: 1 January 1997

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