CVD silicon carbide mirrors for EUV applications

Ritva A. M. Keski-Kuha; John F. Osantowski; Douglas B. Leviton; Timo T. Saha; Geraldine A. Wright; Rene A. Boucarut; Charles M. Fleetwood; Timothy J. Madison

doi:10.1117/12.225286

23 October 1995 CVD silicon carbide mirrors for EUV applications

Ritva A. M. Keski-Kuha, John F. Osantowski, Douglas B. Leviton, Timo T. Saha, Geraldine A. Wright, Rene A. Boucarut, Charles M. Fleetwood, Timothy J. Madison

Author Affiliations +

Proceedings Volume 2543, Silicon Carbide Materials for Optics and Precision Structures; (1995) https://doi.org/10.1117/12.225286
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency in the extreme ultraviolet (EUV). For example, the development of chemical vapor deposited (CVD) SiC mirrors provides an opportunity to extend the range of normal incidence instruments down to 60 nm. CVD-SiC is a highly polishable material yielding low scatter surfaces. High UV reflectivity and desirable mechanical and thermal properties make CVD-SiC an attractive mirror and/or coating material for EUV applications. The EUV performance of SiC mirrors as well as some strengths and problem areas are discussed.

Citation Download Citation

Ritva A. M. Keski-Kuha, John F. Osantowski, Douglas B. Leviton, Timo T. Saha, Geraldine A. Wright, Rene A. Boucarut, Charles M. Fleetwood, and Timothy J. Madison "CVD silicon carbide mirrors for EUV applications", Proc. SPIE 2543, Silicon Carbide Materials for Optics and Precision Structures, (23 October 1995); https://doi.org/10.1117/12.225286

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