High-reflectance coatings for space applications in the EUV

Ritva A. M. Keski-Kuha; Jeffrey S. Gum; John F. Osantowski; Charles M. Fleetwood

doi:10.1117/12.140605

21 January 1993 High-reflectance coatings for space applications in the EUV

Ritva A. M. Keski-Kuha, Jeffrey S. Gum, John F. Osantowski, Charles M. Fleetwood

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140605
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency and made possible to consider more complex optical designs in the EUV. The importance of recent developments in chemical vapor deposited silicon carbide (CVD-SiC), SiC films and multilayer coatings is discussed in the context of EUV instrumentation design. The EUV performance of these coatings as well as some strengths and problem areas for their use in space will be addressed.

Citation Download Citation

Ritva A. M. Keski-Kuha, Jeffrey S. Gum, John F. Osantowski, and Charles M. Fleetwood "High-reflectance coatings for space applications in the EUV", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140605

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