Fast online simulation of 3D nanophotonic structures by the reduced basis method

Frank Schmidt; Jan Pomplun; Lin Zschiedrich; Sven Burger

doi:10.1117/12.874726

17 January 2011 Fast online simulation of 3D nanophotonic structures by the reduced basis method

Frank Schmidt, Jan Pomplun, Lin Zschiedrich, Sven Burger

Proceedings Volume 7941, Integrated Optics: Devices, Materials, and Technologies XV; 79410G (2011) https://doi.org/10.1117/12.874726
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

We present algorithmic details and applications of the reduced basis method as efficient Maxwell solver to nanophotonic applications including examples from mask optimization in photolithography and parameter retrieval in inverse problems, e.g., in optical metrology. The reduced basis method is a currently studied approach to the multiple solution of problems depending on a number of geometrical, material and source parameters. Such problems occur frequently in optimization tasks where parameters have to be adjusted in order to minimize some error functionals or in production environments where deviations from ideal structures have to be controlled.

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Frank Schmidt, Jan Pomplun, Lin Zschiedrich, and Sven Burger "Fast online simulation of 3D nanophotonic structures by the reduced basis method", Proc. SPIE 7941, Integrated Optics: Devices, Materials, and Technologies XV, 79410G (17 January 2011); https://doi.org/10.1117/12.874726

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KEYWORDS

Computer simulations

Photomasks

Chemical elements

Nanophotonics

Optical metrology

3D modeling

Optical lithography

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