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Simultaneous detection of intensity and polarization at the pixel-level has many important applications in the mid-infrared
region. In this work a large-format aluminum wire grid micro polarizer array has been fabricated and tested on
silicon substrates. The arrays were made on 150mm silicon wafers using a 193nm deep-UV stepper, with each array
spanning over 1-million pixels. A unique multilayer design and a large-area nanoscale projection lithography combined
with high-aspect ratio wire-grid structures were utilized to achieve optimum extinction coefficient and transmission.
Measured extinction coefficients on test samples exceeded 30-dB, with maximum transmission around 90%. These
arrays could be designed to match the focal-plane array geometry for integration with mid-IR imagers.
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Andrew M. Sarangan, Aziz Mahfoud, Zhi Wu, Qiwen Zhan, David P. Forrai, Darrel W. Endres, John W. Devitt, Robert T. Mack, James S. Harris, "Wiregrid micro-polarizers for mid-infrared applications," Proc. SPIE 6959, Micro (MEMS) and Nanotechnologies for Space, Defense, and Security II, 695915 (30 April 2008); https://doi.org/10.1117/12.778028