Characterization of electrostatically chucked EUVL mask blanks

Rebekah K. Ligman; Emily Y. Shu; Pei-yang Yan

doi:10.1117/12.601043

6 May 2005 Characterization of electrostatically chucked EUVL mask blanks

Rebekah K. Ligman, Emily Y. Shu, Pei-yang Yan

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.601043
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The flatness of electrostatically chucked EUVL reticles was evaluated on two Zerodur bipolar coulombic electrostatic chucks (from Invax Technologies) of different thicknesses, which represent different chuck stiffness, different hardness of the dielectric material used for chuck surface, and different surface flatness finishing. A Zygo GPI interferometer was used to measure the flatness of the chucked reticles, freestanding reticles, and chuck surfaces. The chucked reticle flatness was impacted by the flatness and shape of the front and back sides of the reticle and that of the chuck. Chucked reticle dynamics during chucking and reticle hysterisis were observed. A stable operation range for the e-chucks was found. We also observed backside-particle-induced-out of plane distortion (OPD) on the chucked reticle in the experiments when Cu particles of height 1 to 3μm were placed between the chuck and the reticle backside.

Citation Download Citation

Rebekah K. Ligman, Emily Y. Shu, and Pei-yang Yan "Characterization of electrostatically chucked EUVL mask blanks", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601043

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