Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter

Mingtao Li; Hua Tan; Linshu Kong; Larry Koecher

doi:10.1117/12.537232

20 May 2004 Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter

Mingtao Li, Hua Tan, Linshu Kong, Larry Koecher

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.537232
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Photo-curable nanoimprint lithography (P-NIL), a low pressure and room temperature process, is developed on Nanonex NX-2000 nanoimprintor. The process is capable of achieving uniform imprinting over large area in less than 60 seconds, which is mainly attributed to the Nanonex patented air cushion press (ACP) technology. Nanostructures such as 200nm pitch grating have been successfully demonstrated on 4-inch wafer level using P-NIL on NX-2000 nanoimprintor.

Citation Download Citation

Mingtao Li, Hua Tan, Linshu Kong, and Larry Koecher "Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.537232

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