Impact of photoacid generator structure on DUV resist performance

James F. Cameron; Sheri L. Ablaza; Guangyu Xu; Wang Yueh

doi:10.1117/12.350268

11 June 1999 Impact of photoacid generator structure on DUV resist performance

James F. Cameron, Sheri L. Ablaza, Guangyu Xu, Wang Yueh

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350268
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The structural influence of photoacid generators on DUV resists performance is investigated in both high and low activation energy resists system. The lithographic behaviors of the photoacid generator is considered in terms of the structure of the photogenerated acid and the light sensitive chromophore. First, the lithographic impact of the photogenerated acid is investigated in terms of acid strength and acid size in resists optimized for high and low temperature processing, respectively. Dissolution kinetics, contrast curve data and absorbance data are presented for a series of high and low activation energy resists in which the structure of the photogenerated acid is systematically varied. The results of these studies are discussed in terms of the photogenerated acid, emphasizing the impact of acid strength and size on lithographic performance and resists dissolution rate kinetics for each resists platform. Secondly, the structural influence of the light sensitive PAG chromophore is investigated by comparing the lithographic performance and dissolution rate kinetics are probed in terms of resist type and PAG structure.

Citation Download Citation

James F. Cameron, Sheri L. Ablaza, Guangyu Xu, and Wang Yueh "Impact of photoacid generator structure on DUV resist performance", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350268

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