Free volume variations during exposure and PEB of DUV positive resists: effect on dissolution properties

Laurent Pain; Charles Le Cornec; Charles Rosilio; Patrick Jean Paniez

doi:10.1117/12.241878

14 June 1996 Free volume variations during exposure and PEB of DUV positive resists: effect on dissolution properties

Laurent Pain, Charles Le Cornec, Charles Rosilio, Patrick Jean Paniez

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241878
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The influence of extra free volume content, generated during spin-coating, on the lithographic performance of DUV chemically amplified positive resists has been reported in several papers. During exposure and PEB, the deprotection reaction, together with the evolution of the protecting group, constitute a new source of free volume. As investigated in this study, in addition to the chemical modifications resulting from the deprotection reaction, the free volume content, and its variations during PEB, may affect the dissolution properties of the exposed areas.

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Laurent Pain, Charles Le Cornec, Charles Rosilio, and Patrick Jean Paniez "Free volume variations during exposure and PEB of DUV positive resists: effect on dissolution properties", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241878

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