Micrascan III: 0.25-um resolution step-and-scan system

David M. Williamson; James A. McClay; Keith W. Andresen; Gregg M. Gallatin; Marc D. Himel; Jorge Ivaldi; Christopher J. Mason; Andrew W. McCullough; Charles Otis; John J. Shamaly; Carol Tomczyk

doi:10.1117/12.240939

7 June 1996 Micrascan III: 0.25-um resolution step-and-scan system

David M. Williamson, James A. McClay, Keith W. Andresen, Gregg M. Gallatin, Marc D. Himel, Jorge Ivaldi, Christopher J. Mason, Andrew W. McCullough, Charles Otis, John J. Shamaly, Carol Tomczyk

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240939
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Catadioptric step-and-scan lithography offers specific advantages over step-and-repeat all- refractive (dioptric) systems as resolution requirements drive to 0.25micrometers in volume production. For the Micrascan family of step-and-scan tools this step in the evolutionary path from 0.35micrometers to 0.25micrometers has involved changes to both the projection optics and illumination system.

Citation Download Citation

David M. Williamson, James A. McClay, Keith W. Andresen, Gregg M. Gallatin, Marc D. Himel, Jorge Ivaldi, Christopher J. Mason, Andrew W. McCullough, Charles Otis, John J. Shamaly, and Carol Tomczyk "Micrascan III: 0.25-um resolution step-and-scan system", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240939

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