Step And Scan: A Systems Overview Of A New Lithography Tool

Jere D. Buckley; Charles Karatzas

doi:10.1117/12.953171

25 July 1989 Step And Scan: A Systems Overview Of A New Lithography Tool

Jere D. Buckley, Charles Karatzas

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953171
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The Micrascan I system, a new 0.5-micron lithography tool, employs a 'step-and-scans concept that combines the virtues of ring-field scanning systems with those of conventional step-and-repeat systems. Individual exposure fields on the wafer are sequentially scanned past the arcuate image field of a catadioptric projection optics system with a 4:1 reduction ratio. The reticle is scanned in precisely coordinated fashion by a separate stage. Exposure illumination is provided by a long-life mercury-xenon arc lamp. The concept enables very large field sizes and high system productivity.

Citation Download Citation

Jere D. Buckley and Charles Karatzas "Step And Scan: A Systems Overview Of A New Lithography Tool", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953171

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available