Mega-electron-Volt Ultrafast Electron Microscope (MeV UEM) has become a promising tool to real-time observe ultrafast dynamics at the atomic scale, where a magnetic objective lens system is critical to manipulating the high-energy beam to achieve point-to-point imaging. However, the upper limit of spatial resolution is mainly determined by the high-order chromatic aberration resulting from the electron energy spread and the imaging lens system. A magnetic lens system based on the Russian Quadruplet (RQ) is being studied to improve the degree of symmetry and further reduce the aberration. The beam optics design and multi-target optimization are finished to achieve a good spatial resolution of point-to-point imaging. This paper will introduce the theoretical deviation and design results of our first-stage imaging lens system, and second-order beam optics is optimized further to improve the resolution.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.