As CMOS technology continues to shrink, 2D edge placement errors in lithography can't be ignored especially for some key patterns. The pixel patterns of CMOS image sensor require high lithography fidelity since they will influence the optical properties and electric properties of the device significantly. So the corner rounding effect of pixel patterns should be of special concern. Generally, corner rounding effect in lithography can be compensated by adding serifs at the corner. Serifs can be generated by rule based OPC method or model based OPC method. In this article, a novel model based OPC method to add serifs to corners is introduced. This method first retargets the corners by replacing the corner vertex with a small rectangle placed along 45 degree with the x-y axis. After that, model based OPC is run based on the retargeted patterns. Then we simulate the lithography contour of the corners by commercial OPC software. The geometry of lithography contour is quantitatively evaluated according to the value of corner pullback and the deviation of edge rippling. The relation between the geometry of corner image contour and retarget pattern is investigated. This method has potentials in design of experiment of pixel layout patterns of CMOS image sensors.
Silicon slot waveguides have great potential in hybrid silicon integration to realize nonlinear optical applications. We propose a rectangular-cladding hybrid silicon slot waveguide. Simulation result shows that, with a rectangular-cladding, the slot waveguide can be formed by narrower silicon strips, so the two-photon absorption (TPA) loss in silicon is decreased. When the cladding material is a nonlinear polymer, the calculated TPA figure of merit (FOMTPA) is 4.4, close to the value of bulk nonlinear polymer of 5.0. This value confirms the good nonlinear performance of rectangular-cladding silicon slot waveguides.
Although slot waveguide structures are widely used in all kinds of optical devices, very few articles focus on the issue of optical isolation of slot waveguides. This article, in an effort to bridge the gap in the available literature, focuses on the aspect of optical isolation of slot waveguides and provides definitive rules for application of different slot waveguides in dense integration of optical links. A slot waveguide with a 48-nm-wide slot was fabricated with electron beam lithography and inductively coupled plasma etching.
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