CONFERENCE PROCEEDINGS
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Yuta Kanno
at Nissan Chemical Corp
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Author
Publications (2)
Proceedings Article | 19 March 2012 Paper
Development of Si-HM for NTD process
Wen Liang Huang, Yu Chin Huang, Bo Jou Lu, Yi Jing Wang, Yeh Sheng Lin, Chun Chi Yu, Satoshi Takeda, Yasunobu Someya, Makoto Nakajima, Yuta Kanno, Hiroyuki Wakayama, Rikimaru Sakamoto
Proceedings Volume 8325, 832523 (2012) https://doi.org/10.1117/12.916363
KEYWORDS: Lithography, Photoresist processing, Optical lithography, Semiconducting wafers, Diffusion, Manufacturing, System on a chip, Etching, Photomasks, Materials processing
Proceedings Article | 16 April 2011 Paper
Development of new Si-contained hardmask for tri-layer process
Makoto Nakajima, Yuta Kanno, Wataru Shibayama, Satoshi Takeda, Masakazu Kato, Takashi Matsumoto
Proceedings Volume 7972, 797225 (2011) https://doi.org/10.1117/12.879357
KEYWORDS: Etching, System on a chip, Chromophores, Photoresist materials, Silicon, Lithography, Reflectivity, Photomasks, Sensors, Plasma etching
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