Yusuke Shoji
at DNP
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 11 May 2007 Paper
S. Shimada, N. Kanda, N. Takahashi, H. Nakajima, H. Tanaka, H. Ishii, Y. Shoji, M. Ohtsuki, A. Naitoh, N. Hayashi
Proceedings Volume 6607, 660706 (2007) https://doi.org/10.1117/12.729258
KEYWORDS: Air contamination, Ions, Photomasks, Adsorption, Inspection, Quartz, Semiconducting wafers, Nitrogen, Solids, Laser damage threshold

Proceedings Article | 20 October 2006 Paper
S. Shimada, N. Kanda, N. Takahashi, H. Nakajima, H. Tanaka, H. Ishii, Y. Shoji, M. Otsuki, A. Naito, N. Hayashi
Proceedings Volume 6349, 63491H (2006) https://doi.org/10.1117/12.688936
KEYWORDS: Air contamination, Ions, Photomasks, Adsorption, Inspection, Quartz, Semiconducting wafers, Nitrogen, Solids, Laser damage threshold

Proceedings Article | 20 October 2006 Paper
Y. Suwa, S. Shimada, A. Shigihara, H. Ishii, Y. Shoji, M. Otsuki, A. Naito, S. Sasaki, H. Mohri, N. Hayashi
Proceedings Volume 6349, 63492X (2006) https://doi.org/10.1117/12.690558
KEYWORDS: SRAF, Acoustics, Cavitation, Inspection, Particles, Solids, Interfaces, Mask making, Photomasks, Device simulation

Proceedings Article | 20 August 2004 Paper
Hiroyuki Ishii, Atsushi Tobita, Yusuke Shoji, Hiroko Tanaka, Akihiko Naito, Hiroyuki Miyashita
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557701
KEYWORDS: Ions, Crystals, Photomasks, Reticles, Excimer lasers, Laser crystals, Lithography, Semiconducting wafers, Oxygen, Chromatography

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