Ms. Yuanting Cui Profile

Yuanting Cui

Process Engineer at Qimonda Richmond LLC

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 17 May 2005 Paper

Inheritance scheme for cascading lithography process control parameters technology, layer, and tool

Christopher Gould, Abeer Singhal, Yuanting Cui

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.598749

KEYWORDS: Semiconducting wafers, Lithography, Manufacturing, Process control, Process modeling, Control systems, Tolerancing, Data modeling, Critical dimension metrology, Metrology

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Segmented alignment mark optimization and signal strength enhancement for deep trench process

Yuanting Cui, Frank Goodwin, Richard van Haren

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.532896

KEYWORDS: Optical alignment, Signal processing, Semiconducting wafers, Scanning probe microscopy, Etching, Photoresist processing, Oxides, Chemical mechanical planarization, Reticles, Manufacturing

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Fine tune W-CMP process with alignment mark selection for optimal metal layer overlay and yield benefits

Yuanting Cui, Albert So, Sean Louks

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534343

KEYWORDS: Optical alignment, Chemical mechanical planarization, Polishing, Semiconducting wafers, Etching, Scanning probe microscopy, Oxides, Overlay metrology, Signal processing, Avalanche photodetectors

Read Abstract +

Proceedings Article | 29 April 2004 Paper

Advanced process control applied to metal layer overlay process

Christopher Gould, Yuanting Cui, Sean Louks

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.531837

KEYWORDS: Optical alignment, Overlay metrology, Metals, Semiconducting wafers, Chemical mechanical planarization, Calibration, Process control, Etching, Metrology, Manufacturing

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Fine-tune lens-heating-induced focus drift with different process and illumination settings

Yuanting Cui

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435675

KEYWORDS: Image processing, Semiconducting wafers, Image sensors, Reticles, Critical dimension metrology, Calibration, Logic, Reflectivity, Californium, Algorithm development

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Improving image control by correcting the lens-heating focus drift

Bwo-Jung Cheng, Hsiang-Chung Liu, Yuanting Cui, Jiyou Guo

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389075

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Fourier transforms, Charge-coupled devices, Image sensors, Control systems, Printing, Data centers, Wafer-level optics

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years