Young-Doo Jeon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69242W (2008) https://doi.org/10.1117/12.773075
KEYWORDS: Optical proximity correction, Lithography, Critical dimension metrology, Photomasks, Optical lithography, Lithographic illumination, Semiconducting wafers, Resolution enhancement technologies, Image processing, Scanners

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65183W (2007) https://doi.org/10.1117/12.712016
KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Lithography, Diffraction, Data modeling, Process modeling, Optical properties, Semiconductor manufacturing, Bridges

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600406
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Germanium, Chromium, Reflectivity, Near field, Absorption, Extreme ultraviolet, Multilayers, Lithography

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